MEMS making method of chip-grade atomic clock vapor cell

Abstract

The invention discloses an MEMS making method of a chip-grade atomic clock vapor cell. Through separation of a chemical reaction chamber and a vapor cell chamber, each vapor cell chamber has a corresponding cooling small chamber ceramic cooling plate, thereby realizing uniform distribution of alkali atom content of each produced vapor cell and satisfying a CPT resonance requirement, greatly improving transmittance of the vapor cell and improving finished rate of the vapor cell and strength of a CPT resonance signal. In the MEMS making method, the annealing process to the vapor cell reduce relative frequency drift of a newly manufactured vapor cell per hour from original 10<-7>-10<-8> to 10<-11>-10<-12> so that higher stability and higher reliability are obtained in operation of the ship atomic clock.

Description

technical field [0001] The invention relates to the technical field of atomic clocks, in particular to a MEMS manufacturing method for an atomic gas chamber of a chip-level atomic clock Background technique [0002] Time and frequency references play an important role in a variety of fundamental physics studies and applications in everyday life, including telecommunication network synchronization, secure data transmission, satellite-based inertial navigation, and more. The performance of all these systems is directly related to the fractional frequency stability level of the local clocks they use. Furthermore, with the rapid growth of portable electronic devices and related technologies, these systems require low-cost, low-power, highly miniaturized, and high-performance clocks that can be mass-produced and easily integrated into new instruments and devices. In the past few decades, the development of microelectromechanical systems (MEMS) technology and semiconductor diode ...

AI Technical Summary

Problems solved by technology

In the production of atomic gas chambers, the by-products generated by chemical reactions often adhere to the glass layer or the inner wall of the atomic gas chambers, which will lead to a decrease in the light transmittance of the atomic gas chambers, affecting the CPT effect of basic atoms and modulated lasers

Due to process reasons, the basic atom content of each atomic gas chamber is significantly different, which affects the yield of the atomic gas chamber

And the newly produced atomic gas chambers often have problems such as considerable CPT resonance frequency drift and so on

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