Circuit devices for supplying high-frequency energy and systems for generating electrical discharges

A high-frequency energy and circuit technology, applied in the direction of circuits, discharge tubes, and irreversible DC power input conversion to AC power output, can solve problems such as inappropriateness, achieve reduced line loss, low EMV emission, and simple construction Effect

Active Publication Date: 2021-05-28
克里斯托夫-赫伯特·迪纳
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This additionally makes this generator unsuitable for use in HF low pressure plasma systems

Method used

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  • Circuit devices for supplying high-frequency energy and systems for generating electrical discharges
  • Circuit devices for supplying high-frequency energy and systems for generating electrical discharges
  • Circuit devices for supplying high-frequency energy and systems for generating electrical discharges

Examples

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Embodiment Construction

[0050] Reference is now made to the embodiments of the invention which are illustrated in the accompanying drawings. It should be understood that the embodiments illustrated in the drawings are exemplary only and do not limit the invention per se. Rather, the embodiments are considered only to illustrate possible embodiments of the invention and to enable those skilled in the art to practice the invention. Furthermore, it should be understood that, where necessary, all details encompassed by the scope of the invention may not be set forth in order to provide a concise description of possible embodiments.

[0051] exist figure 1 In , a system 1 is illustrated in a strongly simplified schematic diagram, in particular here as a low-pressure plasma system for processing objects. Such systems can be used, for example, to clean objects made of metal, plastic, glass or ceramics before further processing, such as sputtering, painting, bonding, printing, welding, etc., for Activatio...

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Abstract

A circuit arrangement (12) is realized for supplying high-frequency energy for generating discharges, in particular for plasma generation, in a vacuum chamber (2), said circuit arrangement having: a DC voltage supply (13), a step-up conversion switch circuit (16) and control unit (17). The DC voltage source (13) provides a DC voltage (Ucc). The boost converter switching circuit comprises a series circuit composed of an inductor (18) and a controllable switch (19), wherein the inductor (18) is connected to one pole (21 ) and the first electrode (D) of the switch (19). The second pole (S) of the switch (19) is grounded, and the switch (19) also has a control pole (G). The control unit (17) is configured to control the switch (19) at high frequency in order to generate a periodic, pulsed output voltage (U DS ), the peak magnitude of the output voltage is greater than the magnitude of the direct voltage (Ucc) of the direct voltage power supply (13). directly, without switching, at the output connection (24) with the output voltage (U DS ), the output joint (24) is determined for direct connection with the electrode (8) of the vacuum chamber (2). A system for generating electrical discharges, in particular a low-pressure plasma system, is likewise realized with such a circuit arrangement ( 12 ).

Description

technical field [0001] The invention relates to a circuit arrangement for supplying high-frequency energy for generating an electrical discharge in a vacuum chamber and to a system for generating an electrical discharge. In particular, the invention relates to a circuit arrangement for providing high-frequency energy to generate plasma and a low-pressure plasma system. Background technique [0002] Low-pressure plasma systems, which are relevant here and operate in the high-frequency (HF) range with an excitation frequency for the plasma of more than 1 MHz, are used, for example, before further processing, such as in Cleaning or activating objects made of metal, plastic, glass and ceramics prior to painting, gluing, printing, welding, etc., for etching or coating by means of plasma, for gas lasers, e.g. CO 2 Laser plasmas are generated and used in many additional applications. [0003] "Techniques and Applications of Plasma Chemistry" by John R. Hollahan and Alexis T. Bell...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01J37/32H05H1/46H02M7/48
CPCH02M3/156H02M7/48H05H1/46H01J37/32174H01J37/32816H05H1/466H05H2242/22H01J2237/335
Inventor 克里斯托夫-赫伯特·迪纳
Owner 克里斯托夫-赫伯特·迪纳
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