Device for treating chemical gaseous phase deposition furnace exhaust
A chemical vapor deposition and tail gas technology, applied in chemical instruments and methods, dispersed particle separation, separation methods, etc., can solve problems such as complex structure and affecting the separation effect of macromolecular hydrocarbons, and achieve good heat transfer effect
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[0027] In this embodiment, a system device for treating tail gas of a chemical vapor deposition furnace is proposed in view of the shortcomings of the existing chemical vapor deposition process for cleaning tar during the production process and the problem of short continuous operation time.
[0028] This embodiment includes a chemical vapor deposition furnace body 1 , an exhaust gas pipeline 2 , a tar collecting tank 3 , a baffle 4 , a scrubbing tank 5 , a circulating heating oil inlet 6 and a circulating heating oil outlet 7 . in:
[0029] Such as figure 1 As shown, the upper end of the tail gas pipeline 2 communicates with the upper orifice of the chemical vapor deposition furnace body 1 ; the lower end of the tail gas pipeline 2 communicates with the inlet of the tar collection tank 3 . The outlet of the tar collecting tank 3 is communicated with the inlet of the scrubbing tank 5 through a circulation pipeline. The outlet of the scrubbing tank is communicated with a vacu...
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