Heavy metal tiny precipitate adsorption device
An adsorption device and sediment technology, which is applied in the field of heavy metal fine sediment adsorption devices, can solve the problems of high cost and insufficient adsorption force, and achieve the effects of low cost, ingenious design and low energy consumption
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Embodiment 1
[0012] The structure diagram of the present invention is as figure 1 As shown, the heavy metal fine sediment adsorption device of the present invention includes two cylinders 1 of the same size, a support 4, a copper sheet 5, a pressing device 6, a low-temperature adsorption pool 7, and a high-temperature desorption pool 8, two of which A cylinder of the same size 1 is made of TiO 2 or SrTiO 3 prepared, the height of the cylinder 1 is smaller than the diameter of the cylinder, one end of the cylinder 1 is a smooth end 2, and the other end of the cylinder 1 is a hole end 3 with nanoholes, and the two cylinders 1 are symmetrically fixed on On the support 4 with low conductivity, the smooth end 2 of the cylinder 1 is opposite to the support 4, and a copper sheet 5 is sandwiched between the smooth end 2 and the support 4, and the copper sheet 5 is connected to two cylinders 1 at the same time, the cylinder 1, the support 4. The copper sheet 5 is fixed with a pressing device 6, s...
Embodiment 2
[0022] In the present embodiment, analyze pure TiO 2 or SrTiO 3 The particle size of the powder is 500nm. After sintering in a muffle furnace at 1400°C for 2 hours, one end was corroded with 1M hydrochloric acid solution for 60 minutes, and then washed with deionized water.
Embodiment 3
[0024] In the present embodiment, analysis pure TiO 2 or SrTiO 3 The particle size of the powder is 300nm. After sintering in a muffle furnace at 1300°C for 1 hour, one end was corroded with 0.6M hydrochloric acid solution for 30 minutes, and then washed with deionized water.
[0025] The use method of the present invention is: put the hole end 3 of one of the cylinders 1 into the low-temperature adsorption pool 7, the hole end 3 is the low-temperature end; the hole end 3 of the other cylinder 1 is put into the high-temperature desorption pool 8 , the first deionized water of the high temperature desorption pool 8 is deionized water, the second desorption is the water after the first desorption, and the hole end 3 is the high temperature end. If the cylinder 1 is an N-type semiconductor, it is used to adsorb heavy metal hydroxides. If the cylinder 1 is a P-type semiconductor, it is used to adsorb heavy metal sulfides. During desorption, the rotating device 9 is used to tran...
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