Water treatment method and device

A water treatment device and water treatment technology, applied in water/sewage treatment, natural water treatment, non-polluted water treatment, etc., can solve the problems of high cost and reduced ultraviolet intensity, achieve high TOC removal rate, and improve decomposition efficiency.

Active Publication Date: 2019-06-18
ORGANO CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] However, in the oxidative decomposition method of TOC in a general ultraviolet oxidizing device, an ultraviolet lamp is used, but the ultraviolet lamp is very expensive, and the intensity of ultraviolet light decreases with the passage of the use period, so it takes, for example, one year to carry out the process. 1 replacement

Method used

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Examples

Experimental program
Comparison scheme
Effect test

experiment example 1

[0053] assembled Figure 7 The structure shown in the device. In this device, isopropanol (CH 3 CH(OH)CH 3 ;IPA), then add H 2 o 2 , with added IPA and H 2 o 2 The water is subjected to ultraviolet oxidation treatment. The water quality of the pure water used here is: the resistivity is above 1MΩ·cm, the TOC is below 3μg / L, the dissolved oxygen concentration is 7.8mg / L, and the H 2 o 2 The concentration is below 1 μg / L. This device uses pure water containing IPA as organic matter (TOC component) as water to be treated, and decomposes the organic matter contained in the water to be treated. It can be said that deoxidation treatment by membrane degassing before adding IPA is used. It is used to reduce the dissolved oxygen concentration of the treated water. Considering that degassing through the membrane generally does not remove IPA in water, the Figure 9 The device shown will be obtained by supplying the treated water containing IPA to the deoxidation treatment dev...

experiment example 2

[0065] In addition to setting the TOC concentration of the treated water, that is, the TOC concentration at the inlet of the ultraviolet oxidizing device 31 to 1000 μg / L, an addition of H 2 o 2 The experiment was performed under the same conditions as in Experimental Example 1 except that the addition amount was 20.0 mg / L. The results are shown in Table 2. It can also be obtained by reducing the concentration of dissolved oxygen in the water to be treated and adding H 2 o 2 , so that the TOC removal rate is improved.

[0066] In addition, the dissolved oxygen concentration was adjusted to 7.8 mg / L by bypassing the membrane degassing module 11, and the H 2 o 2The addition amount of was set as 0mg / L, 2.5mg / L, and the TOC removal rate was measured. These results are also shown in Table 2. Bypassing the membrane degassing module 11 means that the concentration of dissolved oxygen is kept substantially at the saturation level under atmospheric pressure without reducing the c...

experiment example 3

[0070] In addition to setting the dissolved oxygen concentration at the inlet of the ultraviolet oxidizing device 31 to 500 μg / L, H 2 o 2 The experiment was performed under the same conditions as in Experimental Example 1 except that the addition amount was 0 mg / L, 1.5 mg / L, 2.5 mg / L, and 5.0 mg / L. The results are shown in Table 3.

[0071] 【table 3】

[0072]

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Abstract

In order to improve the organic matter decomposition efficiency, and achieve a high TOC removal rate, a water treatment device, which subjects, to decomposition treatment, organic matter included in water to be treated, is provided with: a hydrogen peroxide addition device which adds hydrogen peroxide to the water to be treated; an ultraviolet irradiation device which irradiates, with ultraviolet,the water to be treated to which the hydrogen peroxide has been added; a dissolved oxygen measurement means which measures the dissolved oxygen concentration in outlet water of the ultraviolet irradiation device; and a control means which controls the addition amount of the hydrogen peroxide on the basis of the dissolved oxygen concentration measured by the dissolved oxygen measurement means.

Description

technical field [0001] The present invention relates to a water treatment method and apparatus for decomposing organic substances contained in water to be treated as water to be treated. Background technique [0002] Conventionally, pure water such as ultrapure water in which organic substances, ionic components, particles, bacteria, etc. have been highly removed has been used as cleaning water used in the manufacturing process of semiconductor devices or the manufacturing process of liquid crystal display devices. Especially in the manufacture of electronic components including semiconductor devices, a large amount of pure water is used in the cleaning process, and the demand for water quality is also increasing year by year. For pure water used in the cleaning process of electronic component manufacturing, etc., in order to prevent the organic matter contained in the pure water from being carbonized in the subsequent heat treatment process and causing insulation failure, e...

Claims

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Application Information

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IPC IPC(8): C02F1/72B01D61/02C02F1/32C02F1/44
CPCB01D61/02C02F1/32C02F1/44C02F1/72B01D61/025C02F1/008C02F1/325C02F1/441C02F1/722C02F2103/04C02F2209/22C02F2103/346
Inventor 高桥一重菅原广
Owner ORGANO CORP
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