Preparation method for double-selectivity gas sensitive sensor of aluminum-doped tungsten oxide base
A gas sensor, tungsten oxide-based technology, used in instruments, scientific instruments, measuring devices, etc., can solve problems such as poor selectivity, long response-recovery time, and low sensitivity
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Embodiment 1
[0042] Preparation of WO by radio frequency sputtering 3 Film: first use absorbent cotton to dip in absolute ethanol (analytical pure) with a purity greater than 99.7% to scrub the silicon substrate and Al 2 o 3 Ceramic tube;
[0043] (1) Install the 99.9% pure W target material used for magnetron sputtering and the 99.9% pure Al target material used for doping on the radio frequency magnetron cathode target and the DC magnetron cathode target respectively. Vacuumize the system, start the mechanical pump, and the mechanical pump pumps air to the magnetron sputtering chamber. When the pointer of the vacuum gauge drops below 20Pa, start the molecular pump, and use the molecular pump to vacuum until the air pressure of the system reaches 6 ×10 -4 Pa.
[0044] (2) After the vacuum is exhausted, rotate the baffle to cover the silicon substrate, and introduce argon gas, so that the RF magnetron cathode W target and the DC magnetron cathode Al target are pre-sputtered in argon fo...
Embodiment 2
[0057] Preparation of WO by radio frequency sputtering 3 Film: first use absorbent cotton to dip in absolute ethanol (analytical pure) with a purity greater than 99.7% to scrub the silicon substrate and Al 2 o 3 Ceramic tube;
[0058] (1) Install the 99.9% pure W target material used for magnetron sputtering and the 99.9% pure Al target material used for doping on the radio frequency magnetron cathode target and the DC magnetron cathode target respectively. Vacuumize the system, start the mechanical pump, and the mechanical pump pumps air to the magnetron sputtering chamber. When the pointer of the vacuum gauge drops below 20Pa, start the molecular pump, and use the molecular pump to vacuum until the air pressure of the system reaches 6 ×10 -4 Pa.
[0059] (2) After the vacuum is exhausted, rotate the baffle to cover the silicon substrate, and introduce argon gas, so that the RF magnetron cathode W target and the DC magnetron cathode Al target are pre-sputtered in argon fo...
Embodiment 3
[0066] Preparation of WO by radio frequency sputtering 3 Thin film, the steps are as in Example 1, the difference is: the volume ratio of passing into the system is: Ar:0 2 = 2:1 gas. The result of the experiment failed, the gas sensor was not sensitive to 1000ppm methanol and 1000ppm ethanol. The reason is that the partial pressure of oxygen near the target is high, which causes a large number of defects on the surface of the film and cannot form a good metal oxide film.
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