Moisturizing and repairing facial mask and preparation method thereof

A facial mask and moisturizing technology, applied in the field of skin care products, can solve the problems of inability to protect the skin, strong skin irritation, skin dependence, etc., and achieve the effect of high-efficiency function, moisturizing function, and simple preparation method

Pending Publication Date: 2019-07-23
广州市瑞芬化妆品有限公司
View PDF0 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, due to the addition of chemical agents, strong acid and strong alkali, chemical preservatives and other problems,

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Moisturizing and repairing facial mask and preparation method thereof
  • Moisturizing and repairing facial mask and preparation method thereof
  • Moisturizing and repairing facial mask and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1～8

[0023] The preparation method of a kind of moisturizing facial mask provided by the invention comprises the following steps:

[0024] (1) Weigh corn, rice, white fungus, sodium carbonate, yeast, and deionized water according to Table 1; dry the corn, rice, white fungus, remove impurities, mix and pulverize them into a fine powder of 100 mesh size, and mix the fine powder and deionized water Mix with water, add sodium carbonate to adjust the pH value to 8.0-9.5, heat to 100°C and then heat at a constant temperature for 4 hours, then cool to 35-40°C, dissolve the yeast in warm water, stir evenly, and then keep the temperature at 30-40°C Ferment for 24 hours, heat to 80-85°C and keep stirring for 20-30 minutes, then centrifuge after cooling to obtain the compound plant fermentation filtrate;

[0025] (2) Take compound plant fermentation filtrate, wrinkled carrageen extract, carboxymethyl chitosan, preservative, seabuckthorn fruit extract, buffer solvent according to table 2; Met...

Embodiment 1～8 and comparative example 1～4

[0027] The facial mask is prepared by a preparation method similar to Example 1. The difference between Examples 2-8 and Comparative Examples 1-4 and Example 1 is that the amount of raw materials is different. Each raw material in Examples 2-8 and Comparative Examples 1-4 The dosage is shown in Table 1 and Table 2.

[0028] The raw material of compound plant fermentation filtrate in table 1 embodiment 1~8 and comparative example 1~4

[0029] (unit: parts by weight, parts)

[0030] raw material corn rice tremella Sodium carbonate yeast Deionized water Example 1 4.2 4.6 2.1 0.5 0.8 87.8 Example 2 3.0 5.0 1.0 0.5 0.6 89.9 Example 3 5.0 3.0 3.0 0.5 0.5 88.0 Example 4 3.5 3.5 2.0 0.5 1.0 89.5 Example 5 4.0 4.0 1.5 0.5 0.8 89.2 Example 6 4.5 4.5 1.2 0.5 0.8 88.5 Example 7 1.0 10.0 0.5 0.5 2.0 86.0 Example 8 10.0 1.0 5.0 0.5 0.1 83.4 Comparative example 1 4.2 0 2.1 0....

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a moisturizing and repairing facial mask and a preparation method thereof. The moisturizing and repairing facial mask comprises the following raw materials: 80-100 parts of composite plant fermentation filtrate, 0.5-5 parts of chondrus crispus extract, 0.05-0.5 part of carboxymethyl chitosan, 0.1-1 part of a preservative, 0.05-5 parts of sea buckthorn fruit extract and 0.1-4 parts of a buffering agent. The composite plant fermentation filtrate is prepared by fermenting the following raw materials in parts by weight: 1-10 parts of corn, 1-10 parts of rice, 0.5-5 parts ofwhite fungus, 0.1-2 parts of pH regulator, 0.1-2 parts of yeast and 80-100 parts of water. The adopted raw materials have no side effect, the facial mask achieves an edible security level, and the moisturizing and repairing facial mask provided by the invention has a high-efficiency moisturizing function in addition to the repairing function. The preparation method of the facial mask provided bythe invention is simple and safe.

Description

technical field [0001] The invention relates to the technical field of skin care products, in particular to a moisturizing, replenishing and repairing facial mask and a preparation method thereof. Background technique [0002] With the continuous improvement of people's living standards and the continuous development of science and technology, cosmetics occupy an increasingly important position in people's lives, which also greatly drives the development of cosmetic chemistry. There are many facial mask products on the market, and there are various forms of facial masks, such as powder facial masks, ointment facial masks, and film facial masks. However, often due to the addition of chemical agents, strong acid and strong alkali, chemical preservatives and other problems, not only can not achieve the purpose of protecting the skin, but also make the skin dependent or strongly stimulate the skin. Therefore it is necessary to develop a facial mask product that can comprehensiv...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): A61K8/9794A61K8/9728A61K8/9789A61K8/73A61Q19/00
CPCA61K8/736A61K8/9728A61K8/9789A61K8/9794A61K2800/85A61Q19/00
Inventor 丁淑兰孙浩洋
Owner 广州市瑞芬化妆品有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap