Optical readout infrared sensor and preparation method thereof
An infrared sensor and optical readout technology, which is applied in the field of sensors, can solve the problems that the detection sensitivity and response time of the detector need to be further improved, and achieve the goal of improving radiation heat conversion efficiency and thermal deformation, low density, and improving detection sensitivity Effect
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[0074] The present invention also provides a method for preparing an optical readout infrared sensor described in the above technical solution, comprising the following steps:
[0075] A) Depositing a layer of silicon oxide on a silicon substrate, and then etching part of the silicon oxide to form an array of support leg anchor points; the support leg anchor point array is composed of several support leg anchor points;
[0076] B) Deposit a layer of silicon nitride on the silicon oxide layer formed with the anchor point array of the support legs, and then etch part of the silicon nitride to obtain the support legs fixed at the anchor points of the support legs and the support Insulated beams with legs attached;
[0077] C) successively plating buffer layer and the catalyst required for growing carbon nanotubes on the heat insulating beam;
[0078] D) growing vertical carbon nanotubes on the catalyst plating position by vapor deposition, and then laying down the carbon nanotub...
Embodiment 1
[0139] Optical readout infrared sensor
[0140] A carbon nanotube-based optical readout infrared imaging sensor for acquiring and converting infrared signals such as Figure 1~2 As shown, it includes: a silicon substrate 1 and a micro-cantilever unit array fixed on the silicon substrate 1; the micro-cantilever unit array is made up of a plurality of micro-cantilever units, and each micro-cantilever unit consists of two The supporting legs 2 , two heat-insulating beams 3 and two double-material deformation beams 4 are symmetrically distributed on both sides of the heat-absorbing reflective plate 5 , and the supporting legs 2 are fixed on the silicon substrate 1 . The supporting leg 2 and the heat-insulating beam 3 are integrated, the double-material deformed beam 4 and the heat-absorbing reflector 5 are integrated, and the end of the heat-insulating beam 3 and the end of the double-material deformed beam 4 are adhered together by van der Waals force, so that Realize the connec...
Embodiment 2
[0146] Preparation method of optical readout infrared sensor
[0147] according to Figure 5 The optical readout infrared sensor of the structure described in Example 1 is prepared by the shown process flow, Figure 5 It is a schematic diagram of the preparation process of the optical readout infrared sensor provided by the embodiment of the present invention. In the figure, (1) represents the deposition of a silicon oxide film on a silicon substrate; (2) represents the etching of silicon oxide; (3) represents the deposition of nitride Silicon thin film; (4) represents the etching of silicon nitride; (5) represents the deposition catalyst, the catalyst is alumina and iron; (6) represents the growth of carbon nanotubes by water-assisted chemical vapor deposition; (7) represents the use of organic solvents Putting down the carbon nanotubes and densifying them to form an aligned carbon nanotube film; (8) means etching the carbon nanotube film; (9) means depositing a layer of met...
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