A kind of production method of silicon carbide inorganic ceramic film
An inorganic ceramic membrane and production method technology, applied in chemical instruments and methods, membrane, membrane technology, etc., can solve the problems of high production cost, high processing and molding temperature, hindering market operation, etc., and achieve strong anti-pollution ability, The effect of high mechanical strength and reduction of overall production cost
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Examples
Embodiment 1
[0024] 1) Hydrogen etching on the surface of silicon carbide powder:
[0025] Use 100μm silicon carbide powder to spread out evenly to form a thin layer. In a vacuum environment, use hydrogen at a flow rate of 30L / min to carry out hydrogen etching on the surface of silicon carbide powder to form a step array morphology with atomic level flatness. s surface. The etching process is firstly etched at 1100°C for 30min, and then heated to 1300°C for 50min.
[0026] 2) Generate graphene thin layer on the surface of silicon carbide powder:
[0027] After the hydrogen etching on the surface of the silicon carbide powder is completed, the thermal fracture of the carbon-silicon bond is completed under the condition of vacuum protection, so that the silicon atoms on the surface of the silicon carbide powder sublime before the carbon atoms and desorb from the surface, and the carbon atoms enriched on the surface occur. Reconstruction to form a hexagonal honeycomb graphene film. The tem...
Embodiment 2
[0038] 1) Hydrogen etching on the surface of silicon carbide powder:
[0039] Use 30μm silicon carbide powder to spread out evenly to form a thin layer. In a vacuum environment, use hydrogen at a flow rate of 10L / min to carry out hydrogen etching on the surface of silicon carbide powder to form a step array morphology with atomic level flatness. s surface. The etching process is to etch at 1000°C for 30 minutes first, then raise the temperature to 1150°C for 30 minutes, and finally raise the temperature to 1300°C for 40 minutes.
[0040] 2) Generate graphene thin layer on the surface of silicon carbide powder:
[0041]After the hydrogen etching on the surface of the silicon carbide powder is completed, the thermal fracture of the carbon-silicon bond is completed under the protection of argon, so that the silicon atoms on the surface of the silicon carbide powder are sublimated before the carbon atoms and desorbed from the surface, while the carbon atoms enriched on the surfac...
PUM
Property | Measurement | Unit |
---|---|---|
thickness | aaaaa | aaaaa |
thickness | aaaaa | aaaaa |
pore size | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com