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Bimetallic double-ligand-type photosensitive MOF material and preparation method and application thereof

A bimetallic and photosensitive technology, applied in the field of photocatalytic materials, can solve the problems of no photosensitive MOFs materials reported, and achieve good application value, simple preparation process, and cheap synthetic raw materials

Active Publication Date: 2019-09-06
ZHENGZHOU UNIVERSITY OF LIGHT INDUSTRY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] According to the literature survey, there is no report on the photosensitive MOFs materials with the coexistence of double metals and double ligands.

Method used

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  • Bimetallic double-ligand-type photosensitive MOF material and preparation method and application thereof
  • Bimetallic double-ligand-type photosensitive MOF material and preparation method and application thereof
  • Bimetallic double-ligand-type photosensitive MOF material and preparation method and application thereof

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preparation example Construction

[0039] Another aspect of the embodiment of the present invention also provides the preparation method of the bimetallic double-ligand type photosensitive MOF material, which includes: sodium salt, L 1 Ligands and copper salts containing L 2 The solution of the ligand is fully mixed, and then cured at 110-130°C for 58-82 hours to obtain a blue-green block crystal, which is the bimetallic double-ligand photosensitive MOF material, wherein sodium salt, L 1 Ligands, copper salts and L 2 The molar ratio of the ligand is 1:1:5:7˜1:3:8:10.

[0040] Further, the sodium salt, L 1 Ligands, copper salts and L 2 The molar ratio of the ligand is (0.02~0.06):(0.03~0.07):(0.20~0.30):(0.25~0.35), specifically, the sodium salt, L 1 Ligands, copper salts and L 2 The amount of the substance of the ligand is 0.02-0.06 mmol, 0.03-0.07 mmol, 0.20-0.30 mmol, and 0.25-0.35 mmol, respectively.

[0041] Further, the copper salt includes copper perchlorate hydrate, preferably copper perchlorate he...

Embodiment 1

[0052] Example 1: Preparation of bimetallic double-ligand photosensitive MOF material

[0053] Na 10 [α-SiW 9 o 34 ]·18H 2 O (111.2mg, 0.04mmol), CuClO 4 ·6H 2 O (67.8mg, 0.25mmol) and L 1 (20.0mg, 0.05mmol) was added to a mixture of citric acid-sodium citrate buffer solution (3.0mL, pH=4.0), acetonitrile (3.0mL) and methanol (2.0mL), stirred at room temperature for 30min, and then the suspension The turbid liquid was added to a 25mL polytetrafluoroethylene reactor, solidified at 120°C for 72 hours, and finally cooled to room temperature to obtain blue-green block crystals, which were washed with acetonitrile for 3 times and dried at room temperature. The yield About 39%.

Embodiment 2

[0054] Example 2: Preparation of bimetallic double-ligand photosensitive MOF material

[0055] Na 10 [α-SiW 9 o 34 ]·18H 2 O (111.2mg, 0.04mmol), CuClO 4 ·6H 2 O (54.2mg, 0.20mmol) and L 1 (20.0mg, 0.05mmol) was added to a mixture of citric acid-sodium citrate buffer solution (3.5mL, pH=3.0), acetonitrile (2.5mL) and methanol (2.0mL), stirred at room temperature for 25min, and then the suspension The turbid liquid was added to a 25mL polytetrafluoroethylene reaction kettle, solidified at 115°C for 76h, and finally cooled to room temperature to obtain blue-green block crystals, which were washed with acetonitrile for 3 times and dried at room temperature. The yield About 41%.

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Abstract

The invention discloses a bimetallic double-ligand-type photosensitive MOF material and a preparation method and application thereof. The bimetallic double-ligand-type photosensitive MOF material hasthe following chemical formula: H1.5[Na0.5Cu2(L1)(L2)(H2O)].5.5H2O, wherein L1 is 4,4'-(4-(4H-1,2,4-triazol-4-yl)triphenylamino)dibenzoic acid, and L2 is citric acid; the bimetallic double-ligand-typephotosensitive MOF material is crystallized in a monoclinic system, the space group is P2(1) / c, and the cell parameters meet the conditions that a is equal to 15.7471(10) Angstrom, b is equal to 17.8249(10) Angstrom, c is equal to 11.4482(6) Angstrom, beta is equal to 95.314(5) Angstrom, and v is equal to 3199.6(3) Angstrom<3>. The bimetallic double-ligand-type photosensitive MOF material has theperformance of preparing hydrogen through photocatalytic decomposition of water, the preparation process is simple, the reaction condition is mild, and the yield is high.

Description

technical field [0001] The invention belongs to the technical field of photocatalytic materials, and in particular relates to a bimetallic double-ligand photosensitive MOF material and a preparation method thereof, as well as the application of the MOF material in photocatalytic decomposition of water. Background technique [0002] Metal-organic frameworks (MOFs) are a class of crystalline porous materials formed by connecting metal nodes and organic ligands. Among them, the metal node can be a single metal ion (for example: Co 2+ 、Cr 3+ or Al 3+ etc.), or metal clusters with multiple coordination sites (e.g. Cu 2 I 2 , Fe 3 O or Zn 4 O, etc.). On the other hand, organic ligands are usually organic compounds containing nitrogen heterocycles or aromatic carboxylic acids. In recent years, the latest research trend of MOFs chemistry is to design and synthesize MOFs materials containing multi-metals and multi-ligands. Because this kind of multi-component MOFs material i...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C08G83/00B01J31/22C01B3/04
CPCC08G83/008B01J31/1691C01B3/042B01J2531/12B01J2531/16B01J2531/0216B01J35/39Y02E60/36
Inventor 史岽瑛刘春森杜淼崔超杰户敏
Owner ZHENGZHOU UNIVERSITY OF LIGHT INDUSTRY