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Method for manufacturing graphene patterns

A production method and graphene technology, applied in the direction of graphene, nano-carbon, etc., can solve the problems of graphene radiation damage, etc., and achieve the effects of reducing difficulty, low production cost, and simple operation process

Pending Publication Date: 2019-09-10
NINGBO UNIV
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  • Description
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  • Application Information

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Problems solved by technology

This method uses oxygen plasma etching, which inevitably causes radiation damage to the graphene part.

Method used

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  • Method for manufacturing graphene patterns

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Embodiment Construction

[0021] The present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments.

[0022] Such as figure 1 Shown, the manufacture method of the graphene pattern in the present embodiment is characterized in that: comprise the following steps:

[0023] S1. Use photoresist to make a carrier on the graphene growth substrate; wherein the graphene growth substrate can choose copper sheet or nickel sheet according to needs, and usually choose copper sheet as the graphene growth substrate;

[0024] Specifically, during operation, the copper sheet is placed on a glass slide, and gaskets are placed on both sides of the copper sheet. In this embodiment, in order to ensure the stability of the gasket placement, a special adhesive tape can be used to stick on the copper sheet. On both sides, the adhesive tapes on both sides are separated by 1.5 cm, and then the copper sheet is also fixed on the glass slide; then from the microstructure...

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Abstract

The invention relates to a method for manufacturing graphene patterns. The method comprises the following steps: manufacturing a carrier by using a photoresist on a graphene growth substrate; carryingout curing treatment on the carrier according to design patterns; removing the uncured photoresist in the carrier so as to obtain a first sample with a micro structure carrier; putting the first sample into a CVD (chemical vapor deposition) heating furnace, and generating graphene patterns under a limiting function of the micro structure carrier so as to obtain a second sample; coating graphene of the second sample by a protection membrane solution, and generating a protection membrane so as to obtain a third sample; putting the third sample into a solution for corroding the graphene growth substrate, and corroding the graphene growth substrate so as to obtain a fourth sample; and cleaning the fourth sample, putting the fourth sample into a solution for removing the protection membrane, and removing the protection membrane on the graphene patterns, so as to obtain the graphene patterns. The method for manufacturing the graphene patterns is simple in operation process, the generated graphene patterns are high in precision, and in addition, the graphene patterns are low in manufacturing cost.

Description

technical field [0001] The invention relates to a method for making a graphene pattern. Background technique [0002] Graphene is an allotrope of carbon. It is a two-dimensional material formed by carbon atoms arranged in a hexagonal honeycomb lattice. In terms of properties, graphene has transparency, high electrical conductivity, high thermal conductivity, high strength-to-weight ratio and good Its ductility and other characteristics make it widely used. Graphene has been applied in the production of solar photovoltaic devices, flexible materials, new displays, and catalysts. Therefore, graphene and its related devices have become a research hotspot in the fields of physics, chemistry, biology and material science. [0003] In the prior art, the mainstream method for preparing graphene is chemical vapor deposition (referred to as CVD), and chemical vapor deposition is considered to be the most promising effective way to realize large-scale preparation of graphene material...

Claims

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Application Information

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IPC IPC(8): C01B32/186
CPCC01B32/186
Inventor 丁阿飞陶卫东胡绪瑞范时鸣王刚
Owner NINGBO UNIV
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