Magnetron sputtering rotary target material binding method
A magnetron sputtering and rotating target technology, which is applied in sputtering coating, metal material coating process, ion implantation coating, etc., can solve the problems of complicated equipment operation, low oil bath temperature, affecting yield, etc., to achieve Avoid uneven distribution, increase deposition rate, and reduce production cost
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[0017] A method for binding a magnetron sputtering rotating target, comprising the following steps:
[0018] (1) Treatment of the inner surface of the rotating target tube: the metallization of the inner surface of the rotating target tube is achieved by means of conventional ultrasonic surface treatment, and the thickness of the formed metallized layer is 0.1-0.3 mm. For example, the thickness of the metallization layer is 0.1, 0.2 or 0.3 mm. The purpose of metallizing the inner surface of the rotating target tube is to reduce the wetting angle of the metal solder on the inner surface of the target tube, thereby improving the adhesion between the metal solder and the surface of the target tube. The material used for metallization is one or more of indium, copper, tin, silver and nickel. When several kinds of indium, copper, tin, silver and nickel are used for mixing, they can be in any proportion.
[0019] (2) Treatment of the outer surface of the stainless steel pipe: Firs...
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