A kind of polishing fluid for improving the surface of ABS fused deposition molding and preparation method thereof
A technology of fused deposition molding and polishing liquid, which is applied in the direction of polishing composition, chemical instruments and methods, etc., can solve the problems of large influence on the physical properties of the matrix material, long fumigation soaking time, and long reaction time, etc., and achieves strong implementability, Shorten the polishing cycle and improve the surface quality
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Examples
Embodiment 1
[0022] This embodiment provides a polishing solution for improving the surface of ABS fused deposition molding, which consists of the following components by mass percentage: 30% polymethyl methacrylate, 70% of the previous mixed solution;
[0023] The previous mixed solution is composed of the following components according to mass percentage: 40% of methyl methacrylate, 25% of ethyl acetate, 10% of methyl ethyl ketone, and 25% of ethanol.
[0024] This embodiment also provides a method for preparing a polishing liquid for improving the surface of ABS fused deposition molding, which is used to prepare the polishing liquid of this embodiment, specifically implemented according to the following steps:
[0025] Step 1. Take 40% of methyl methacrylate, 25% of ethyl acetate, 10% of ethyl ketone, and 25% of ethanol according to the mass percentage, and mix the above components evenly to obtain a premixed solution;
[0026] Step 2, heating the pre-mixed solution to 30°C to obtain th...
Embodiment 2
[0030] This embodiment provides a polishing solution for improving the surface of ABS fused deposition molding, which consists of the following components by mass percentage: 40% polymethyl methacrylate, 60% mixed solution in the previous stage;
[0031] The previous mixed solution is composed of the following components by mass percentage: 50% of methyl methacrylate, 25% of ethyl acetate, 10% of methyl ethyl ketone, and 15% of ethanol.
[0032] This embodiment also provides a method for preparing a polishing liquid for improving the surface of ABS fused deposition molding, which is used to prepare the polishing liquid of this embodiment, specifically implemented according to the following steps:
[0033] Step 1. Take 50% of methyl methacrylate, 25% of ethyl acetate, 10% of butanone, and 15% of ethanol according to the mass percentage, and mix the above components evenly to obtain a premixed solution;
[0034] Step 2, heating the pre-mixed solution to 50°C to obtain the pre-mi...
Embodiment 3
[0038] This embodiment provides a polishing solution for improving the surface of ABS fused deposition molding, which consists of the following components by mass percentage: 32% polymethyl methacrylate, 68% of the previous mixed solution;
[0039] The previous mixed solution is composed of the following components by mass percentage: 47% of methyl methacrylate, 28% of ethyl acetate, 5% of methyl ethyl ketone, and 25% of ethanol.
[0040] This embodiment also provides a method for preparing a polishing liquid for improving the surface of ABS fused deposition molding, which is used to prepare the polishing liquid of this embodiment, specifically implemented according to the following steps:
[0041] Step 1. Take 47% of methyl methacrylate, 28% of ethyl acetate, 5% of butanone, and 15% of ethanol according to the mass percentage, and mix the above components evenly to obtain a premixed solution;
[0042] Step 2, heating the pre-mixed solution to 38°C to obtain the pre-mixed solu...
PUM
Property | Measurement | Unit |
---|---|---|
surface roughness | aaaaa | aaaaa |
surface roughness | aaaaa | aaaaa |
surface roughness | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com