Preparation method of Co-Pt / Fe-Pt nanoparticle with adjustable composition
A nanoparticle, co-pt technology, applied in the field of preparation of Co-Pt/Fe-Pt nanoparticles, can solve problems such as difficulty in uniform deposition, and achieve the effects of simple process, excellent three-dimensional adhesion, and simple film thickness control.
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Embodiment 1
[0025] A method for preparing Co-Pt nanoparticles with adjustable composition, comprising the following steps:
[0026] (1) ALD deposition of cobalt oxide film: using surface growth of 300 nm SiO 2 The silicon wafer was used as the substrate, and cobalt oxide was grown for 100, 200, and 300 cycles respectively, and the growth parameters were as follows:
[0027] Reaction chamber temperature: 250 o C;
[0028] Reaction source: cobaltocene (Co(Cp) 2 ) as the metal source, the source temperature is 85 o C, ozone as an oxygen source;
[0029] Pulse and cleaning time: metal source pulse is 1 s, high-purity nitrogen gas cleaning is 5 s; ozone pulse is 1.5 s; followed by high-purity nitrogen gas cleaning for 10 s to wash away reaction by-products and residual reaction sources;
[0030] (2) ALD deposition of metal platinum: continue ALD deposition of metal platinum on the substrate obtained in step (1) with cobalt oxide, and grow 50, 100, 150, 200 cycles of metal platinum. The AL...
Embodiment 2
[0039] A method for preparing Co-Pt nanoparticles with adjustable composition, comprising the following steps:
[0040] (1) ALD deposition of cobalt oxide thin film: use cleaned carbon fiber paper as the substrate, and grow cobalt oxide for 100 cycles. The growth parameters are as follows:
[0041] Reaction chamber temperature: 250 o C;
[0042] Reaction source: cobaltocene (Co(Cp) 2 ) as the metal source, the source temperature is 85 o C, ozone as an oxygen source;
[0043] Pulse and cleaning time: metal source pulse is 5 s, high-purity nitrogen gas cleaning is 20 s; ozone pulse is 5 s; followed by high-purity nitrogen gas cleaning for 20 s to wash away reaction by-products and residual reaction sources.
[0044] (2) ALD deposition of metal platinum: continue ALD deposition of metal platinum on the substrate obtained in step (1) with cobalt oxide, and grow 100 cycles of metal platinum. The ALD growth parameters of platinum are as follows:
[0045] Reaction chamber temper...
Embodiment 3
[0052] A method for preparing Co-Pt nanoparticles with adjustable composition, comprising the following steps:
[0053] (1) ALD deposition of cobalt oxide film: use the cleaned AAO template as the substrate, and grow cobalt oxide for 50 cycles. The growth parameters are as follows:
[0054] Reaction chamber temperature: 400 o C;
[0055] Reaction source: cobaltocene (Co(Cp) 2 ) as the metal source, the source temperature is 85 o C, ozone as an oxygen source;
[0056] Pulse and cleaning time: metal source pulse is 3 s, high-purity nitrogen cleaning is 15 s; ozone pulse is 3 s; followed by high-purity nitrogen cleaning for 15 s, flushing away reaction by-products and residual reaction sources.
[0057] (2) ALD deposition of metal platinum: continue ALD deposition of metal platinum on the substrate obtained in step (1) with cobalt oxide, and grow 50 cycles of metal platinum. The ALD growth parameters of platinum are as follows:
[0058] Reaction chamber temperature: 400 o C...
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