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Method for processing mask substrate by using laser

A laser processing and facial mask technology, which is applied in laser welding equipment, metal processing equipment, manufacturing tools, etc., can solve problems such as disobedience, affecting the use effect, and not being skin-friendly, so as to broaden the selection range, increase the surface area, and improve air permeability. Effect

Inactive Publication Date: 2019-12-20
INNO LASER TECH CORP LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, due to the limitation of the substrate, different masks have their own advantages and disadvantages.
For example, the base material of non-woven mask is fluffy, soft, with good uniformity of cotton net, no lint, strong and durable, but the material is thick and not skin-friendly, and the affinity with the skin is not good, which will cause dissatisfaction and poor air permeability. Generally, affect the overall use effect

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0020] When the mask base material is a synthetic fiber non-woven fabric, the mask base material is a patch mask base material, and the synthetic fiber non-woven fabric is used to make a mask base material by directly using high polymer slices, short fibers or filaments for orientation or random arrangement. , to form a fiber mesh structure, and then reinforced by mechanical, thermal bonding or chemical methods. Polypropylene particles are mostly used as raw materials for non-woven fabrics, which are heat-sensitive materials. The selected laser light source should not only meet the threshold of material action, but also not change the function of the material itself too much to prevent melting and other phenomena. Ultra-fast laser is used to process the mask base material, the laser pulse width is preset to 1.9ps, the laser wave band is preset to 532nm, the focus spot size is preset to 10μm, the roundness of the spot is required to be above 85%, the laser can be set to an adjus...

Embodiment 2

[0027] The base material of the mask is synthetic fiber non-woven fabric, and the base material of the mask is a sheet mask base material. The base material of the mask made of synthetic fiber non-woven fabric is directly oriented or randomly arranged by polymer slices, short fibers or filaments to form The fiber mesh structure is then reinforced by mechanical, thermal bonding or chemical methods. Polypropylene particles are mostly used as raw materials for non-woven fabrics, which are heat-sensitive materials. The selected laser light source should not only meet the threshold of material action, but also not change the function of the material itself too much to prevent melting and other phenomena. Ultra-fast laser is used to process the mask base material, the laser pulse width is preset to 1.5ps, the laser waveband is 515nm, the focus spot size is preset to 10μm, the roundness of the spot is required to be above 85%, the laser can be set to an adjustable repetition frequency...

Embodiment 3

[0034] The base material of the mask is synthetic fiber non-woven fabric, and the base material of the mask is a sheet mask base material. The base material of the mask made of synthetic fiber non-woven fabric is directly oriented or randomly arranged by polymer slices, short fibers or filaments to form The fiber mesh structure is then reinforced by mechanical, thermal bonding or chemical methods. Polypropylene particles are mostly used as raw materials for non-woven fabrics, which are heat-sensitive materials. The selected laser light source should not only meet the threshold of material action, but also not change the function of the material itself too much to prevent melting and other phenomena. Ultrafast laser is used to process the mask base material, the laser pulse width is preset at 1ps, the laser waveband is 523nm, the focus spot size is preset at 10μm, the roundness of the spot is required to be above 90%, the laser can be set at an adjustable repetition rate of 500k...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
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Abstract

The invention discloses a method for processing a mask substrate by using a laser, and relates to the technical field of laser processing. The method comprises the following steps of processing a micro-spacing structure on the mask substrate by using the laser, wherein the adjacent intervals of the micro-spacing structure are 20 microns-100 microns, the focused spot size of the laser is controlledat 5 microns-30 microns, the laser band parameter is 400 nm-800 nm, the light spot roundness is required to be 85% or above, the laser-adjustable repetition frequency is 80 kHz-1000 kHz, and the beamquality M2 is less than 1.3. According to the method for processing the mask substrate by using the laser, the mask substrate is subjected to processing and the micro-interval structure is processedon the surface of the mask substrate by using the laser technology and choosing proper laser parameters, so that the threshold of the material effect is met without changing the function of the material and destroying the original structure of the mask substrate. According to the method, the obtained mask substrate has selective penetration or adsorption on different molecules, so that the effectof essence is fully exerted, and the selection range of the substrate is also widened.

Description

technical field [0001] The invention relates to the technical field of laser processing, in particular to a method for processing a mask substrate by using laser. Background technique [0002] With the improvement of living standards, people pay more attention to the maintenance of appearance while paying attention to physical health. In our daily skin care products, in addition to the well-known moisturizing water, essence, etc., there are also sheet masks that are increasingly widely used. Depending on the ingredients of the functional liquid added to the mask, different skin care effects can be achieved, such as moisturizing, whitening, cleaning, and anti-aging. According to different mask materials, the sheet mask substrates currently on the market are divided into natural fiber non-woven fabrics and synthetic fiber non-woven fabrics, which can be further divided into fruit and vegetable fiber masks, pure cotton masks, crystal masks and invisible silk masks. And so on....

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B23K26/352
CPCB23K26/352
Inventor 赵晓杰吴双秦国双
Owner INNO LASER TECH CORP LTD
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