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Waterproof nano-film, preparation method and application thereof, and product with waterproof nano-film

A technology of nano-membrane and reactive raw materials, which can be used in anti-corrosion coatings, textiles and papermaking, vacuum evaporation plating, etc., and can solve the problems of poor hydrophobicity of nano-coatings

Active Publication Date: 2020-01-10
JIANGSU FAVORED NANOTECHNOLOGY CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0010] An object of the present invention is to provide a waterproof nano-membrane and its preparation method, application and product, which improves the shortcoming of the poor hydrophobicity of the deposited nano-coating when the number of carbon atoms in the perfluorocarbon chain is lower than 6

Method used

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  • Waterproof nano-film, preparation method and application thereof, and product with waterproof nano-film
  • Waterproof nano-film, preparation method and application thereof, and product with waterproof nano-film
  • Waterproof nano-film, preparation method and application thereof, and product with waterproof nano-film

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preparation example Construction

[0076] According to an embodiment of the present invention, the overall preparation method of the waterproof nano-membrane may include the following steps:

[0077] 1) Substrate preparation

[0078] Before performing chemical vapor deposition on the substrate, the substrate needs to be cleaned first. Dust, moisture, grease, etc. on the surface of the substrate will adversely affect the deposition effect. Clean the substrate with acetone or isopropanol, and then dry it in a drying oven.

[0079] 2) The substrate is subjected to chemical vapor deposition to prepare a nano-coating.

[0080] (1) Place the substrate with a clean surface in the reaction chamber of the plasma device or equipment, then continuously evacuate the reaction chamber, and evacuate the vacuum degree in the reaction chamber to 1-2000 millitorr;

[0081] (2) Turn on the movement mechanism to make the substrate in a moving state in the cavity; introduce plasma source gas, and use radio frequency discharge or...

Embodiment 1

[0090] Using the PCB board as the base material, the waterproof nano-coating is formed on the surface of the PCB board through the PECVD device, carbon tetrafluoride is used as the plasma source gas, and monomer 1 (1H, 1H, 2H, 2H-perfluorooctyl alcohol acrylate) As the reaction raw material, the specific steps are: (1) The PCB board is placed in a 200L plasma vacuum reaction chamber, and the reaction chamber is continuously evacuated to make the vacuum degree reach 20 millitorr. (2) Feed carbon tetrafluoride with a flow rate of 40 sccm, turn on radio frequency discharge for plasma discharge, and discharge with a discharge power of 100 W for 100 seconds. (3) Vaporize 1H,1H,2H,2H-perfluorooctyl alcohol acrylate (monomer 1) and introduce it into the reaction chamber, and perform chemical vapor deposition on the surface of the substrate to prepare a nano-coating. During the coating preparation process, the monomer vapor flow rate was 120 μL / min, the passage time was 2000 s, and th...

Embodiment 2

[0092] Using the PCB board as the base material, the waterproof nano-coating is formed on the surface of the PCB board through a PECVD device, carbon tetrafluoride is used as the plasma source gas, and monomer 1 (1H, 1H, 2H, 2H-perfluorohexanol acrylate) As the reaction raw material, the specific steps are: (1) The PCB board is placed in a 200L plasma vacuum reaction chamber, and the reaction chamber is continuously evacuated to make the vacuum degree reach 30 millitorr. (2) Introduce carbon tetrafluoride with a flow rate of 40 sccm, turn on the radio frequency discharge for plasma discharge, and discharge with a discharge power of 120 W for 100 s. (3) Vaporize 1H,1H,2H,2H-perfluorohexanol acrylate (monomer 1) and introduce it into the reaction chamber, and perform chemical vapor deposition on the surface of the substrate to prepare a nano-coating. During the coating preparation process, the monomer vapor flow rate was 150 μL / min, the passage time was 2500 s, and the pulse wid...

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Abstract

The invention provides a waterproof nano-film, a preparation method and application thereof, and a product with the waterproof nano-film. The waterproof nano-film is formed on the surface of a substrate through a plasma enhanced chemical vapor deposition method with fluorocarbon gas as a plasma source, and thus, the water resistance of the surface of the substrate is improved.

Description

technical field [0001] The present invention relates to a surface-modified thin film, more specifically, it relates to a waterproof nano-membrane formed by a plasma-enhanced chemical vapor deposition method and its preparation method, application and product. Background technique [0002] Depositing a thin film on the surface of a substrate to achieve surface modification of the substrate is a commonly used technique, for example, to improve dielectric properties, waterproof or hydrophobic properties, etc. through thin film deposition. Deposition of thin films can be accomplished by a number of techniques, well known techniques include chemical deposition, physical deposition, and hybrids of the two. For chemical deposition, the more common techniques are plating, chemical solution deposition (CSD) and chemical vapor deposition (CVD). For physical deposition, well known techniques such as thermal evaporation, sputtering, pulsed laser deposition and cathodic arc deposition. ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B05D1/00C09D4/02C09D4/00
CPCC09D5/00C09D5/08C23C16/513D06N3/00D06N2209/142C23C16/505B05D1/62B05D5/083C23C14/12C23C16/04D06M14/34D06M10/025D06M10/08D06M15/256D06M15/277C09D133/16C09D137/00C09D143/04
Inventor 宗坚
Owner JIANGSU FAVORED NANOTECHNOLOGY CO LTD