A three-dimensional carbon array cathode structure decorated with titanium metal and its preparation method
A cathode structure and metal titanium technology, which is applied in cold cathode manufacturing, electrode system manufacturing, discharge tube/lamp manufacturing, etc., can solve the problems that the current density needs to be increased, so as to reduce the shielding effect, improve the bonding strength, reduce the Effects of Turn On Field and Threshold Field
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Embodiment 1
[0032] 1) Preparation of three-dimensional carbon array
[0033] Process the cleaned cork into a cuboid of 20mm x 20mm x 5mm, dry it at 70°C for 6 hours, put the cork into a ceramic boat, and then place the ceramic boat containing the cork in a high-temperature horizontal tube-type vacuum-controlled In the furnace; first evacuate the tube furnace to 0.1pa, then feed high-purity Ar gas (99.999) with a flow rate of 300 mL / min into the tube furnace, and then turn on the heating power to control the heating rate at 1 °C / min, heated to 1100°C and held for 1.5 hours, then the cork was cooled to room temperature with the furnace under the protection of Ar gas, and a three-dimensional carbon array with regular arrangement was obtained.
[0034] 2) Ion etching on the surface of three-dimensional carbon array
[0035] Fix the three-dimensional carbon array obtained in step 1) on the carrier of the magnetron sputtering coating chamber, first turn on the mechanical pump and the molecula...
Embodiment 2
[0042] 1) Preparation of three-dimensional carbon array
[0043] Process the cleaned cork into a cuboid of 20mm x 20mm x 5mm, dry it at 70°C for 6 hours, put the cork into a ceramic boat, and then place the ceramic boat containing the cork in a high-temperature horizontal tube-type vacuum-controlled In the furnace; first evacuate the tube furnace to 0.1pa, then feed high-purity Ar gas (99.999) with a flow rate of 300 mL / min into the tube furnace, and then turn on the heating power to control the heating rate at 1 °C / min, heated to 1100°C and held for 1.5 hours, then the cork was cooled to room temperature with the furnace under the protection of Ar gas, and a three-dimensional carbon array with regular arrangement was obtained.
[0044] 2) Ion etching on the surface of three-dimensional carbon array
[0045] Fix the three-dimensional carbon array obtained in step 1) on the carrier of the magnetron sputtering coating chamber, first turn on the mechanical pump and the molecula...
Embodiment 3
[0056] 1) Preparation of three-dimensional carbon array
[0057] Process the cleaned cork into a cuboid of 20mm x 20mm x 5mm, dry it at 70°C for 6 hours, put the cork into a ceramic boat, and then place the ceramic boat containing the cork in a high-temperature horizontal tube-type vacuum-controlled In the furnace; first evacuate the tube furnace to 0.1pa, then feed high-purity Ar gas (99.999) with a flow rate of 300 mL / min into the tube furnace, and then turn on the heating power to control the heating rate at 1 °C / min, heated to 1100°C and held for 1.5 hours, then the cork was cooled to room temperature with the furnace under the protection of Ar gas, and a three-dimensional carbon array with regular arrangement was obtained.
[0058] 2) Ion etching on the surface of three-dimensional carbon array
[0059] Fix the three-dimensional carbon array obtained in step 1) on the carrier of the magnetron sputtering coating chamber, first turn on the mechanical pump and the molecula...
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