Unlock instant, AI-driven research and patent intelligence for your innovation.

Exposure device

A technology of exposure device and light spot, which is applied to exposure device of photoengraving process, exposure equipment of microlithography, optics, etc., can solve problems such as manufacturing difficulty of exposure device, and achieve the goal of reducing alignment accuracy, reducing deviation and improving exposure accuracy. Effect

Active Publication Date: 2022-07-12
DAINIPPON SCREEN MTG CO LTD
View PDF6 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Therefore, there is a concern that the manufacture of the exposure device becomes more difficult

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Exposure device
  • Exposure device
  • Exposure device

Examples

Experimental program
Comparison scheme
Effect test

no. 1 approach ＞

[0047] figure 1 It is a side view which shows an example of the schematic structure of the exposure apparatus 10 of 1st Embodiment. figure 2 It is a top view which shows an example of the schematic structure of the exposure apparatus 10 of 1st Embodiment.

[0048] The exposure apparatus 10 is a direct imaging type drawing apparatus, that is, an apparatus that exposes (draws) a pattern (for example, a circuit pattern) by irradiating pattern light (drawing light) spatially modulated based on CAD data or the like on the object to be processed (also referred to as "drawing"). as a pattern exposure device). As the object to be processed, for example, the upper surface of the substrate W (the upper surface of the photosensitive material layer) on which a layer of a photosensitive material such as a resist is formed, or the like is used. More specifically, the substrate W that is an object to be processed by the exposure apparatus 10 includes, for example, a semiconductor substrat...

no. 3 approach ＞

[0133] In each of the above-described embodiments, for example, the adjustment of the relative positional relationship between the spatial light modulator 820 and the MLA unit 824 may be performed automatically by the control of the control unit 9 .

[0134] Figure 13 It is a block diagram which shows the bus line of the exposure apparatus of 3rd Embodiment. Figure 13 In the block diagram of , the block diagram of each of the above-mentioned embodiments ( Figure 8 ) as a base, the drive unit 860 is added to the constituent elements of the exposure apparatus 10 connected to the control unit 9, and the position adjustment unit 911 is added to the functional element realized by the operation of the CPU 90 according to the program 920.

[0135] The drive unit 860 includes, for example, at least one of the first drive unit 820d and the second drive unit 824d. Thereby, the drive unit 860 can move at least one movable unit of the spatial light modulator 820 and the MLA unit 824,...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The present invention easily improves the exposure accuracy of the two-dimensional pattern of the exposure device. The exposure apparatus includes a light emitting unit, a microlens array unit, and a sensor unit. The light-emitting portion has a plurality of light-emitting regions that emit light. The microlens array section has an effective area and an ineffective area. The effective area includes a plurality of microlenses respectively located on the paths of lights respectively emitted by the plurality of light emitting areas. The non-effective area is located outside the effective area and includes markings for adjustment. The sensor portion includes a plurality of light-receiving elements arranged in the first direction and a plurality of light-receiving elements arranged in the second direction. The sensor unit can output a signal of the relative positional relationship between the adjustment light spot and the adjustment mark, and the adjustment light spot is emitted from the light emitting section and passes through the area of ​​the inactive area including the adjustment mark on the path of the light from a plurality of The light-emitting region for adjustment in the light-emitting region emits a light spot formed by the light irradiated to the non-effective region.

Description

technical field [0001] The present invention relates to an exposure device. Background technique [0002] Patent Documents 1 and 2 describe exposure apparatuses that expose the photosensitive material in a desired two-dimensional pattern by irradiating the photosensitive material with pattern light formed by spatial modulation. The exposure apparatus uses a micromirror device (DMD) to spatially modulate light output from a light source to form patterned light. The patterned light is imaged on the photosensitive material through the optical system. [0003] Here, the optical system includes, for example: a first imaging optical system for imaging patterned light formed by DMD; a microlens array (MLA) arranged on an imaging surface of the first imaging optical system; and light passing through the MLA A second imaging optical system imaged on the photosensitive material. The MLA includes a plurality of microlenses arranged two-dimensionally so as to correspond to the microm...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20
CPCG03F7/70258G03F7/70275G03F7/70308G03F7/20G03F7/70391G03F7/70116
Inventor 水野博文茂野幸英
Owner DAINIPPON SCREEN MTG CO LTD