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67results about How to "Reduced alignment accuracy" patented technology

Low-precision inertial navigation initial alignment method based on quaternion CKF

The invention provides a low-precision inertial navigation initial alignment method based on a quaternion CKF. The low-precision inertial navigation initial alignment method comprises the following steps: carrying out coarse alignment by utilizing measured values of an accelerometer and a magnetometer to obtain a coarse attitude matrix; taking a position and a speed error as value measurement by using accurate outside information provided by a GPS (Global Position System); carrying out nonlinear filtering by the quaternion CKF to obtain an attitude error matrix; and finally, correcting by using the attitude error matrix to obtain an accurate attitude matrix. According to the low-precision inertial navigation initial alignment method, the value measurement of the gravitational acceleration and the magnetic force, which is carried out by the accelerometer and the magnetometer, is subjected to the coarse alignment. The problems that the gyroscope performance is low under the condition of a low-precision inertial device, the rotation angle speed of the earth can not be accurately sensed and a traditional coarse alignment method can not be applied are solved; furthermore, the quaternion CKF provided by the method can be used for a non-linear model of a large angle error, can still finish alignment under the condition of a large orientation misalignment angle and has high alignment precision.
Owner:HARBIN ENG UNIV

Color filter, color filter manufacturing method, display panel, display device and driving method

The invention provides a color filter, a color filter manufacturing method, a display panel, a display device and a driving method. The color filter comprises multiple colored color resistors and multiple pixel regions, wherein the multiple colored color resistors include the red color resistors, the green color resistors and the blue color resistors, the multiple pixel regions are arranged in a matrix mode, each pixel region comprises a red sub-pixel region, a green sub-pixel region and a blue sub-pixel region, each red sub-pixel region comprises red inferior sub-pixel regions, the number of the red inferior sub-pixel regions of each red sub-pixel region is an even number, one red color resistor is arranged in each red inferior sub-pixel region, each green sub-pixel region comprises green inferior sub-pixel regions, the number of the green inferior sub-pixel regions of each green sub-pixel region is an even number, one green color resistor is arranged in each green inferior sub-pixel region, each blue sub-pixel region comprises blue inferior sub-pixel regions, the number of the blue inferior sub-pixel regions of each blue sub-pixel region is an even number, and one blue color resistor is arranged in each blue inferior sub-pixel region. Compared with the prior art, the manufacturing precision of a mask plate required by the color filter is lowered, the alignment precision is lowered, and the manufacturing difficulty of the color filter is lowered.
Owner:HEFEI XINSHENG OPTOELECTRONICS TECH CO LTD +1

Array substrate and manufacturing method therefor and display apparatus

The invention relates to an array substrate and a manufacturing method therefor and a display apparatus, and aims to solve the problem of a relatively complex manufacturing process of a TFT substrate, so that an effective mode for reducing photolithography techniques without lowering product yield is needed urgently. The manufacturing method comprises the steps of forming a gate metal layer pattern, a gate insulating layer thin film, an active layer pattern and source and drain metal layer patterns on a substrate; forming a planarization layer thin film, a first electrode layer pattern, a first insulating layer thin film and a photoresist pattern on the source and drain metal layer patterns in sequence; performing a dry etching process on the first insulating layer thin film and the planarization layer thin film in sequence, wherein via holes formed in the first insulating layer thin film, a first shielding electrode and the planarization layer thin film form a first through hole; and forming a second electrode layer pattern which comprises a first bridging electrode on the first insulating layer thin film, and enabling the first bridging electrode to at least fully cover the first through hole region and to be connected with the source and drain metal layer patterns.
Owner:SHANGHAI TIANMA MICRO ELECTRONICS CO LTD

On-chip periodic variation refractive index lens photon chip three-dimensional coupler and preparation method thereof

The invention discloses an on-chip periodic variation refractive index lens photon chip three-dimensional coupler. The coupler comprises a photon chip, a periodic variation refractive index lens layer and an optical fiber, wherein the photon chip comprises a silicon substrate, and a ridge waveguide, an analogue-spot converter and a grating which grow and are etched on the top surface of the silicon substrate; an input port of the analogue-spot converter is equal to the ridge waveguide in width, and is connected with a waveguide port of the ridge waveguide; an output port of the analogue-spot converter is equal to the grating in width, and is connected with an input port of the grating; the periodic variation refractive index lens layer is connected to the top surface of the grating; and the optical fiber is connected to the top surface of the periodic variation refractive index lens layer. The coupler has the advantages of small size, convenience for integration, strong optical field restraint and low demand to the aligning precision, and can achieve efficient and quick coupling between the chip and the optical fiber. And at the same time, the invention further discloses a preparation method for the coupler; and the preparation method is simple and feasible.
Owner:SOUTHEAST UNIV

Manufacturing method for source and drain region contact plug of metal gate transistor

Disclosed is a manufacturing method for a source and drain region contact plug of a metal gate transistor. a) for a technology of high K gate dielectric layer last and metal gate first, and in a process of removing a pseudo gate structure and filling in a high K gate dielectric layer, a work function layer and a metal gate, and b) for a technology of high K gate dielectric layer first and metal gate last, and in a process of removing a pseudo gate and filling in a work function layer and a metal gate, an etching barrier layer is formed on the metal gate structure, wherein the two ends of the etching barrier layer are both wider than the metal gate structure. By virtue of the etching barrier layer, even if alignment between a mask plate and a substrate has deviation or even if an opening, corresponding to a through hole, in the mask plate is relatively large, in a photoetching technology of forming a contact through hole in the source and drain regions in a dielectric layer subsequently, the through hole formed by etching does not expose the metal gate due to protection of the etching barrier layer on the covered metal gate structure and dielectric layer below the etching barrier layer; and therefore, a conductive materiel arranged in the through hole in a filling way is not in electrical conduction with the metal gate, so that the yield of a device is improved, the alignment precision between the mask plate and the substrate is lowered, and the requirement on the photoetching fineness is lowered.
Owner:SEMICON MFG INT (SHANGHAI) CORP +1

Guide device for safely locating construction hoist cage and installation method for cage

The invention discloses a guide device for safely locating a construction hoist cage and an installation method for the cage. The guide device facilitates installation of the cage and solves the problem of potential safety hazards. The guide device comprises a cylindrical body formed by an upper portion guide section, a middle guide section and a lower portion locating section, wherein the upper portion guide section, the middle guide section and the lower portion locating section are coaxially arranged. The upper portion guide section of the cylindrical body is of a cone-shaped guide structure. The middle guide section is matched with a guide porthole formed by a guide wheel set of the construction hoist cage. The lower portion locating section is matched with an upper pipe orifice of a standard-knot stand column of a construction hoist. After the lower portion locating section extends into the pipe cavity of the stand column, a side gap is formed between the lower portion locating section and the inner pipe wall of the pipe cavity and enables the cylindrical body to deflect at the upper end of the stand column in a small-angle mode. The diameter of the lower portion locating section is smaller than that of the middle guide section, so that a locating step used for being meshed with the end face of the upper pipe orifice is formed on the joint portion of the middle guide section and the lower portion locating section. By means of the guide device, the location difficulty of the cage is lowered, and the danger such as pinching of hands can be avoided.
Owner:成都建工第二建筑工程有限公司

Method for eliminating solder mask ink in via hole of printed circuit board

The invention discloses a method for eliminating solder mask ink in a via hole of a printed circuit board, which comprises the steps of S1, cleaning a substrate and a conductive copper layer on the surface of the substrate, roughening the surface of the conductive copper layer through a polishing device, and cleaning the substrate and the conductive copper layer again; S2, carrying out silk-screenprinting, specifically, printing an ink layer with a preset color on the conductive copper layer; S3, conducting pre-baking, specifically, pre-baking the silk-screen printed circuit board; S4, performing primary exposure, specifically, performing alignment exposure by using a film, performing photocuring on the solder mask ink, and shielding the via hole and the periphery by using a shading partof the film; S5, developing for the first time, and removing the ink at the position shielded by the shading part of the film; S6, drying the circuit board. S7, performing secondary exposure, specifically, performing secondary alignment exposure by using a film, and performing secondary photocuring on the ink layer; S8, developing for the second time, and removing the residual solder resist ink inthe via hole; and S9, drying the circuit board. The solder mask ink in the via hole can be effectively eliminated, the integrity of an ink layer is ensured, and assembly welding bridge partition is prevented.
Owner:四川英创力电子科技股份有限公司

A low-precision inertial navigation initial alignment method based on quaternion ckf

The invention provides a low-precision inertial navigation initial alignment method based on a quaternion CKF. The low-precision inertial navigation initial alignment method comprises the following steps: carrying out coarse alignment by utilizing measured values of an accelerometer and a magnetometer to obtain a coarse attitude matrix; taking a position and a speed error as value measurement by using accurate outside information provided by a GPS (Global Position System); carrying out nonlinear filtering by the quaternion CKF to obtain an attitude error matrix; and finally, correcting by using the attitude error matrix to obtain an accurate attitude matrix. According to the low-precision inertial navigation initial alignment method, the value measurement of the gravitational acceleration and the magnetic force, which is carried out by the accelerometer and the magnetometer, is subjected to the coarse alignment. The problems that the gyroscope performance is low under the condition of a low-precision inertial device, the rotation angle speed of the earth can not be accurately sensed and a traditional coarse alignment method can not be applied are solved; furthermore, the quaternion CKF provided by the method can be used for a non-linear model of a large angle error, can still finish alignment under the condition of a large orientation misalignment angle and has high alignment precision.
Owner:HARBIN ENG UNIV

Method for testing service life of friction clutch of torque backlash type gearshift mechanism

The invention discloses a method for testing service life of a friction clutch of a torque backlash type gearshift mechanism. The method comprises the following steps of S1, detaching one or a plurality of members in a low-speed-gear driving tooth, low-speed-gear driven tooth and an overrunning clutch; S2, connecting an input shaft with a driving motor, and locking an output shaft; S3, setting a rotating speed parameter and a highest cycling number-of-times Nmax of the driving motor; S4, setting testing end conditions of a, time ratio of a period in which Tm is smaller than or equal with Tdn_min/i2 in a rotating speed increase period of the driving motor exceeds deltax, wherein Tm is the torque of the driving motor, Tdn_min is a gear shifting-down torque allowable range lower limit value,i2 is a high-speed-gear transmission ratio of the torque backlash type gearshift mechanism, and deltax is a preset value; b, the cycling number-of-times Nx of the driving motor satisfies a condition of Nx=Nmax; and S5, starting the driving motor, and ending testing when a random condition the step S4 is satisfied. The method according to the invention has advantages of simplifying a testing deviceand a testing flow, reducing testing cost, and improving testing efficiency and testing precision.
Owner:SOUTHWEST UNIVERSITY

Exposure method for color film substrate

The invention discloses an exposure method for a color film substrate. The method comprises the following steps of S1, providing a substrate, forming black matrix layers at intervals on an upper surface of the substrate, and taking a region without the black matrix layers as an opening region; S2, covering an upper surface of the opening region of the substrate and an upper surface of the black matrix layer with a negative photosensitive adhesive layer; S3, providing a mask version body of which the upper surface is provided with a shielding layer, forming the mask version body below the substrate, and arranging the shielding layer towards the substrate; and S4, exposing light beams perpendicular to a plane of a mask plate penetrating through the region, not provided with the shielding layer, of the mask plate body from the lower portion of the mask plate body, and the photosensitive adhesive layer so that the color filter layer is formed through the process including development. Themethod is advantaged in that the mask plate is formed on a lower surface of the substrate, the shading property of a black matrix layer on an upper surface of the substrate is utilized, so segment difference is eliminated, and the precision requirement of the mask plate and the alignment precision requirement of an exposure machine are reduced.
Owner:信利(仁寿)高端显示科技有限公司

Double-sided PERC solar cell and preparation method thereof

The invention discloses a double-sided PERC solar cell and a preparation method thereof. The preparation method comprises the following steps of: performing texturing, diffusion, front laser doping, back polishing and etching, back passivation film deposition, back anti-reflection film deposition and front anti-reflection film deposition on a P-type silicon wafer; and printing a back electrode andback grid lines on the back anti-reflection film, printing a front electrode on the front anti-reflection film, and performing sintering and electric injection annealing. The back grid lines are printed by adopting corrosion type aluminum paste, and the corrosion type aluminum paste etches the back anti-reflection film and the back passivation film in the sintering process to form ohmic contact with the silicon wafer. According to the method, the corrosion type aluminum paste is printed on the back surface of the cell, the back anti-reflection film and the passivation film are etched and penetrated during sintering to realize local opening, an existing laser opening process is replaced, good ohmic contact between metal aluminum and a silicon wafer is realized in combination with back surface boron doping, and mechanical damage and fragment rate caused by laser opening are avoided; and the production process is simplified, and the production cost is reduced.
Owner:CHANGZHOU SHICHUANG ENERGY CO LTD

Display panel, manufacturing method thereof, and display device

The present application discloses a display panel, a manufacturing method thereof, and a display device. The display panel includes an array substrate and a driver. The array substrate includes a display part and a binding part. The binding part includes a plurality of binding electrodes arranged at intervals. The component includes a driving part, the driving part is provided with a plurality of driving electrodes arranged at intervals, and the plurality of binding electrodes include a first high-voltage electrode group and a second high-voltage electrode group adjacently arranged, and the first high-voltage electrode group includes at least Two first high-voltage electrodes, the second high-voltage electrode group includes at least two second high-voltage electrodes spaced apart, one of the two adjacent driving electrodes is crimped and fixed with the corresponding at least two first high-voltage electrodes, and the other It is crimped and fixed to at least two corresponding second high-voltage electrodes, and the distance between the two driving electrodes is greater than the distance between the first high-voltage electrode group and the second high-voltage electrode group. The display panel of the technical solution of the present application can improve the problem of short-circuit burn caused by voltage bias.
Owner:HKC CORP LTD

Top-loading coke oven smokeless coal charging device

The invention discloses a smokeless coaling device of a top-charging coke oven. The smokeless coaling device comprises a flashboard device, and a coal charging sleeve, wherein the flashboard device is arranged at the upper part of the coal charging sleeve. The smokeless coaling device is characterized in that a built-in flashboard device is arranged inside the flashboard device; the coal charging sleeve comprises an upper sleeve, a fixed sleeve, a movable sleeve, a sleeve sealing device, and a fire hole sealing device; a fire hole sealing base matched with the fire hole sealing device is arranged on the plane of the fire hole; an outer sleeve capable of axially stretching is also arranged; the outer sleeve is sleeved outside the fire hole sealing device; the upper end of the outer sleeve is connected with the movable sleeve; a work surface butted with the plane of the fire hole is formed at the lower end of the outer sleeve; a drive device guide rack is arranged at the side of the coal charging sleeve; and a movable sleeve drive device for driving the movable sleeve to axially move up and down and an outer sleeve drive device for driving the outer sleeve to axially stretch are connected with the drive device guide rack. By adopting the device, effective sealing of the fire hole of the coal charging furnace is achieved, a raw coke oven gas generated in the coal charging process enters a gas collecting pipe system through an ascend pipe, and the air quantity requirements on a dust removal system also can be reduced.
Owner:苏循高 +1

A telescopic outrigger for large-scale construction equipment that can be easily plugged in and out

The invention discloses a large-size construction equipment telescopic supporting leg convenient to insert and extract. The large-size construction equipment telescopic supporting leg comprises a pin shaft assembly, an outer telescopic joint and an inner telescopic joint. The outer telescopic joint and the inner telescopic joint are nested mutually to form a supporting leg body. The pin shaft assembly comprises a pin shaft and a handle arranged at the end of the pin shaft. The outer telescopic joint is provided with outer pin shaft holes for allowing the pin shaft to penetrate through. The inner telescopic joint is provided with inner pin shaft holes and a guide cylinder which are used for allowing the pin shaft to penetrate through. A pin shaft supporting device is further arranged at the outer pin shaft holes and is hollow pipeline. The pin shaft is arranged in the hollow pipeline of the supporting device. According to the large-size construction equipment telescopic supporting leg convenient to insert and extract, compared with the prior art, when needing to be inserted and extracted, the pin shaft only needs to be pulled and pushed in the pin shaft supporting device and the pin shaft holes and does not need to be manually lifted up to be inserted and extracted, and the labor intensity is relieved.
Owner:宿州学院

Solar cell string, solar cell module and manufacturing method thereof

The invention relates to a solar battery string, comprising more than two cells serially connected in stack form, where each cell includes an aluminum back field, a back passivated layer, a polysilicon substrate, a positive passivated layer, an antireflective film, positive silver fingers and a positive silver electrode which are arranged sequentially from bottom to top; in two cells serially connected in stack manner, the positive silver electrode of the front cell is connected with the aluminum back field of the rear cell via conductive glue; in the cells serially connected in stack manner,a busbar is connected with the aluminum back field of the first cell via conductive glue, and a busbar is connected or directly welded to the positive silver electrode of the last cell via conductiveglue. The solar battery string herein has the advantages that the usage of back silver paste can be decreased, the silkscreen printing process is simplified, and the material cost is low; the back silver electrodes are omitted while the conducting capacity is equivalent to that of the string having the back silver electrodes; conductive connection is reliable and stable; the passivated area of thealuminum back field is enlarged, so that photon utilization efficiency is improved; in addition, the requirement on aligning precision of the stack process is lowered; gaps among the modules are utilized, and the cells that can be added under the same area are 13% and above more than those in conventional modules.
Owner:CHANGCHUN YONGGU TECH
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