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Plasma photoresist device

A technology of photoresist and plasma, applied in the field of ion resist, to achieve the effect of increasing the pumping rate, ensuring the processing yield, and improving the product yield

Pending Publication Date: 2020-03-17
昆山索坤莱机电科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] However, the traditional plasma photoresist equipment is in a vacuum chamber, and only one wafer can be placed in the chamber, and the plasma is generated through parallel electrode plates to etch the residual glue and organic contamination materials on the wafer surface

Method used

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  • Plasma photoresist device
  • Plasma photoresist device
  • Plasma photoresist device

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Experimental program
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Effect test

Embodiment approach

[0020] figure 1 An embodiment of a plasma photoresist device of the present invention is shown, including an outer shell 1, a water-passing electrode pipeline 2, a water-passing electrode plate group 3, an insulating material bracket 4, and a vacuum chamber 5, the vacuum chamber The body 5 is set in the outer shell 1, and the back of the vacuum chamber 5 is connected with an integrated water-passing electrode pipeline 2 and a water-passing kit 6. The water-passing electrode pipeline 2 is connected to the radio frequency power supply through a connecting cable, and the water-passing electrode plate The group is arranged in the vacuum chamber 5;

[0021] The rear and lower parts of the vacuum chamber 5 are provided with an evacuation pipeline 7, and the evacuation pipeline 7 is connected to a vacuum pump, which effectively improves the pumping rate and the uniformity of plasma distribution inside the chamber, and effectively improves the quality of the processed product. Rate; ...

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PUM

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Abstract

The invention discloses a plasma photoresist device. The device comprises an outer shell, a water-through electrode pipeline, a water-through polar plate set, an insulating material bracket and a vacuum cavity. The vacuum cavity is formed in the outer shell, the rear portion of the vacuum cavity is connected with the integrated water-through electrode pipeline and a water-through external member,the water-through electrode pipeline is connected with a radio frequency power source through a connecting cable, and the water-through polar plate set is arranged in the vacuum cavity. The water-through type electrode plate of the plasma photoresist device has the advantages that 1) the temperature in the cavity can be effectively controlled, and the treatment requirements of different products can be met; 2) the optimal effect and treatment uniformity can be achieved, the treatment yield is guaranteed, and meanwhile the treatment efficiency is improved.

Description

technical field [0001] The invention relates to the technical field of plasma photoresist, in particular to a plasma photoresist device. Background technique [0002] Plasma resist is a common form in dry etching. Its principle is that the gas exposed to the electron region forms a plasma, and the resulting ionized gas and gas composed of released high-energy electrons form plasma or ions, ionizing gas atoms When accelerated by an electric field, sufficient force and surface repelling forces are released to tightly bond materials or etch surfaces. The plasma processing equipment that works on this principle uses the free radicals in the plasma to bombard or sputter the surface molecules of the etched material to form volatile substances, so as to achieve the purpose of resist. [0003] At present, plasma treatment equipment is widely used in plasma cleaning, etching, plasma plating, plasma coating, plasma ashing and surface activation, modification and other occasions. Thr...

Claims

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Application Information

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IPC IPC(8): H01J37/32
CPCH01J37/32568H01J2237/334
Inventor 刘向伟刘善石
Owner 昆山索坤莱机电科技有限公司