Manufacturing method of nano-channel with gradually-changed size

A technology of nano-channel and manufacturing method, applied in the field of nano-channel manufacturing, to achieve the effects of expanding the application range, facilitating biochemical analysis, and avoiding channel blockage

Pending Publication Date: 2020-03-24
SHENZHEN INST OF ADVANCED TECH +1
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0005] In view of this, it is necessary to address the existing problems in the fabrication

Method used

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  • Manufacturing method of nano-channel with gradually-changed size
  • Manufacturing method of nano-channel with gradually-changed size
  • Manufacturing method of nano-channel with gradually-changed size

Examples

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Embodiment 1

[0041] This embodiment provides a method for fabricating nanochannels with graded sizes, comprising the following steps:

[0042] Step 1, the making of nanowire structure template; its making process is as follows figure 2 shown.

[0043] Step 1.1, take a piece of quartz glass with high light transmittance and flat surface as the substrate, wash the quartz glass with water and acetone, put it in an oven, and bake it at 130°C for 10 minutes to remove water vapor and residual acetone. After natural cooling, put it into an asher and incinerate for one hour to enhance its surface adhesion. Then apply a layer of tackifier (AZAD PROMOTER tackifier) ​​on the surface of the quartz through a glue leveler to increase the viscosity of the substrate and prevent the debonding of the photoresist during development. The speed of the homogenizer is 1500r / min, the time is 30s, and placed in an oven at 90°C for 10 minutes;

[0044]Step 1.2, after pre-processing the quartz substrate, coat it...

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Abstract

The invention provides a manufacturing method of a nano-channel with a gradually-changed size. The manufacturing method comprises the following steps: manufacturing a nano-line structure template: coating a photoresist I on the surface of one side of a quartz glass substrate I; carrying out holographic exposure and development after exposure is finished until a nanowire structure appears in the photoresist I; carrying out ion beam etching on the developed photoresist I under protective gas, and removing the photoresist after etching to obtain a nanowire structure template; carrying out Nanoimprint lithography on a nano line structure on the nanoimprint transfer template: coating photoresist II on a quartz glass substrate II; coating the nano-line structure template with a release agent, pressing the nano-line structure template into the photoresist II, and carrying out ultraviolet exposure until the nano-line structure on the template is transferred to the photoresist II; after transfer is completed, modifying and curing the photoresist II, and removing the nanowire structure template ; dividing a nanowire structure region on a nanowire structure substrate into a plurality of parts, and silicon dioxide thin film deposition is carried out one by one according to a gradual change angle in sequence.

Description

technical field [0001] The invention relates to a method for manufacturing a nanochannel, in particular to a method for manufacturing a nanochannel with a gradient size. Background technique [0002] The micro-nanofluidic chip can shrink the basic operations involved in the fields of biology and chemistry, such as sample preparation, biochemical reaction, separation, detection, etc., onto a substrate with a size of tens of square centimeters. By designing an appropriate micro-nano channel structure, the fluid can flow in a certain way in the channel, so that the chip can obtain specific functions as a whole. However, as the size of the channel decreases, the influence of the size effect will increase, and the fluid in the micro-nano channel will have some specific properties different from the macroscopic fluid. For example, when the channel size reaches the nanoscale, quantum effects, interface effects, and nanoscale effects cannot be ignored. Therefore, fluidic systems b...

Claims

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Application Information

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IPC IPC(8): B81C1/00G03F7/00
CPCB81C1/00015B81C1/00349B81C1/00388G03F7/0002B81C2201/0198Y02P70/50
Inventor 金建邸思袁海
Owner SHENZHEN INST OF ADVANCED TECH
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