Preparation methods of polycrystalline silicon wafer texturing liquid and black silicon material and application of polycrystalline silicon wafer texturing liquid and black silicon material in accelerating LeTID recovery of PERC battery
A technology for polycrystalline silicon wafers and texturing liquid, which is applied in chemical instruments and methods, sustainable manufacturing/processing, circuits, etc., can solve the problems of complicated steps, high cost, environmental pollution, etc., and achieves streamlined process, low cost, and environmental friendliness. Effect
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[0056] Example 1
[0057] A polysilicon texturing liquid, the preparation method is as follows:
[0058] (1) Take 1 mL of PNVA aqueous solution and dissolve in 8 mL of water;
[0059] (2) Take 16mL of HF aqueous solution, Mn(NO 3 ) 2 Add 64 mL of the aqueous solution of fluorine to the solution obtained in step (1), mix uniformly to obtain a polysilicon texturing solution (wherein, the molar concentration of HF is 4.24mol / L, Mn(NO 3 ) 2 The molar concentration of is 3.1mol / L).
[0060] A black silicon material, the preparation method is as follows:
[0061] (1) Put the prepared polysilicon texturing liquid in a constant temperature water bath at 25°C;
[0062] (2) Place the polycrystalline silicon wafer in the above polycrystalline silicon wafer texturing liquid and etch for 3 minutes;
[0063] (3) The etched polycrystalline silicon wafer is cleaned by the RCA standard cleaning method to remove impurities and dried to obtain a black silicon material.
[0064] figure 1 It is the scanning el...
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[0065] Example 2
[0066] A polysilicon texturing liquid, the preparation method is as follows:
[0067] (1) Take 8 mL of PNVA aqueous solution and dissolve it in 16 mL of water;
[0068] (2) Take 16mL of HF aqueous solution, Mn(NO 3 ) 2 64mL of the aqueous solution of HF was added to the solution obtained in step (1) and mixed uniformly to obtain a polysilicon texturing solution (wherein, the molar concentration of HF is 3.63mol / L, Mn(NO 3 ) 2 The molar concentration of 2.6mol / L).
[0069] A black silicon material, the preparation method is as follows:
[0070] (1) Put the prepared polysilicon texturing liquid in a constant temperature water bath at 15°C;
[0071] (2) Place the polycrystalline silicon wafer in the above polycrystalline silicon wafer texturing liquid and etch for 3 minutes;
[0072] (3) The etched polycrystalline silicon wafer is cleaned by the RCA standard cleaning method to remove impurities and dried to obtain a black silicon material.
[0073] figure 2 Is the scanning...
Example Embodiment
[0074] Example 3
[0075] A polysilicon texturing liquid, the preparation method is as follows:
[0076] (1) Take 4 mL of PNVA aqueous solution and dissolve in 8 mL of water;
[0077] (2) Take 16mL of HF aqueous solution, Mn(NO 3 ) 2 Add 64 mL of the aqueous solution of fluorine to the solution obtained in step (1), mix uniformly to obtain a polysilicon texturing solution (wherein, the molar concentration of HF is 4.24mol / L, Mn(NO 3 ) 2 The molar concentration of is 3.1mol / L).
[0078] A black silicon material, the preparation method is as follows:
[0079] (1) Put the prepared polysilicon texturing liquid in a constant temperature water bath at 18°C;
[0080] (2) Place the polycrystalline silicon wafer in the above-mentioned polycrystalline silicon wafer texturing liquid for etching for 1 min;
[0081] (3) The etched polycrystalline silicon wafer is cleaned by the RCA standard cleaning method to remove impurities and dried to obtain a black silicon material.
[0082] image 3 Is the scann...
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