Nickel target blank and manufacturing method of target material
A manufacturing method and nickel target material technology, which is applied in metal material coating process, ion implantation plating, coating, etc., can solve the problems of nickel target blank defects, material waste, etc.
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[0027] It can be seen from the background technology that in the prior art, the manufactured nickel target blanks are often easy to get gas and generate inclusions during the manufacturing process, and the formed nickel target blanks have defects, which are not satisfied with the application in the semiconductor industry, resulting in material waste and increased costs.
[0028] Analysis shows that in the prior art, the method to make the manufactured nickel target meet the various parameters in the semiconductor industry is to strictly control the parameters in the annealing process after rolling. However, a large number of facts have proved that However, the defect of the manufactured nickel target blank cannot be completely overcome.
[0029] In order to solve the above problems, the present invention provides a new method, providing nickel ingots; performing the first annealing process on the nickel ingots, the temperature of the first annealing process is 900°C-950°C; Th...
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