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A continuous vacuum diffusion furnace

A technology of vacuum diffusion and furnace door, which is applied in the direction of diffusion/doping, polycrystalline material growth, crystal growth, etc., and can solve the problems of limited expansion of furnace capacity, improvement of efficiency, unfavorable process, etc.

Active Publication Date: 2021-04-20
LAPLACE RENEWABLE ENERGY TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The furnace body in the prior art is usually vertical, and one piece of equipment is usually equipped with one furnace body. In this way, if the output of a single furnace body is to be increased, the capacity of the furnace body must be enlarged, but the expansion of the furnace body capacity The scale is limited, and a single furnace body will consume a lot of time in the process of loading and unloading and conveying, which is not conducive to the improvement of efficiency in terms of process

Method used

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  • A continuous vacuum diffusion furnace
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Embodiment Construction

[0046] Specific embodiments of the present invention will be described in further detail below in conjunction with the accompanying drawings. It should be noted that specific embodiments are only detailed elaborations of the present invention, and its purpose is to enable those skilled in the art to better understand and implement the present invention. regarded as a limitation of the present invention.

[0047] figure 1 and figure 2 It shows the overall appearance structure of the present invention and the matching structure of a set of reaction furnace and boat moving system. As shown in the figure, the present invention provides a continuous vacuum diffusion furnace, including a feeding part and a reaction furnace part, wherein the feeding part is as figure 1 and 2 As shown in the middle left half, the part of the reactor is as follows figure 1 and 2 As shown in the middle right half, the feeding part includes a feeding frame 100 and a boat moving mechanism. The boat...

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Abstract

The invention provides a continuous vacuum diffusion furnace, which includes a feeding part and a reaction furnace part. The vacuum diffusion furnace includes at least two reaction furnaces, and each reaction furnace corresponds to a set of feeding parts. At least two reaction furnaces are up and down Or arranged side by side; each reaction furnace and feeding part can work independently to achieve continuous production. The invention can realize the vacuum sealing and continuous production of the furnace body, and through the rational design of the structure of the diffusion furnace, the process order is improved and the output of the diffusion furnace is increased.

Description

technical field [0001] The present invention relates to a vacuum diffusion furnace. Background technique [0002] Semiconductor or photovoltaic materials are widely used in electronics, new energy and other industries. Semiconductor and photovoltaic materials usually need to be processed before they can be applied to products. CVD technology, diffusion process or oxidation process are some of the existing processing methods. [0003] Diffusion furnace, as one of the important equipment of semiconductor device process equipment, is widely used in the production of integrated circuits, power electronics, solar cells and other industries. In the photovoltaic industry, high-temperature diffusion furnaces are mainly used for doping single crystal silicon wafers and polycrystalline silicon wafers. , forming a PN junction. With the development of the photovoltaic industry, people have been pursuing the improvement of production capacity. In the manufacturing process, there will b...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C30B31/06C30B29/06
CPCC30B29/06C30B31/06
Inventor 刘群林佳继张武朱太荣庞爱锁林依婷
Owner LAPLACE RENEWABLE ENERGY TECH CO LTD
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