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Coating process effectively improving firmness of chalcogenide glass coating film

A chalcogenide glass, fastness technology, applied in the direction of metal material coating process, coating, sputtering coating, etc., can solve the problem of easy stripping of chalcogenide glass, to increase the resistance to damage and corrosion resistance, good optical performance, the effect of increasing optical performance

Inactive Publication Date: 2020-05-29
CHENGDU GUOTAI VACUUM EQUIP CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] The purpose of the present invention is to provide a coating process that effectively improves the firmness of the chalcogenide glass coating film layer. When coating, the optimization of the parameters on the basis of not changing the film structure can solve the problem that the chalcogenide glass is easy to release the film. a question

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  • Coating process effectively improving firmness of chalcogenide glass coating film
  • Coating process effectively improving firmness of chalcogenide glass coating film

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Embodiment 1

[0038] The present invention designs a coating process that effectively improves the firmness of the chalcogenide glass coating film layer, and optimizes the parameters on the basis of not changing the film structure during the coating process to solve the problem that the chalcogenide glass is easy to release the film , especially adopt the following setting method: use vacuum chamber for coating processing of chalcogenide glass, use vacuum chamber for coating processing of chalcogenide glass, the vacuum chamber is at 120-130°C (preferably 130°C) before the melting material starts, the conditions The constant temperature is not less than 30min (preferably 30min), and the ion energy parameters are both voltage 240-280V and current 7-10A when the ion source is cleaning the chalcogenide glass substrate and the ion source is helping to plate the transition layer film. They are all 260V / 8A, and are cooled by step cooling after the coating is completed.

[0039] As a preferred sett...

Embodiment 2

[0041] This embodiment is further optimized on the basis of the above embodiments, and the same parts as the aforementioned technical solutions will not be repeated here. Further, in order to better realize the present invention, the following setting methods are particularly adopted: the process method includes the following Describe the specific steps:

[0042] 1) Before melting the material, adjust the vacuum chamber to 130°C (anywhere between 120°C and 130°C, but not more than 130°C) and keep the temperature constant for 30 minutes (the constant temperature time is at least 30 minutes); the adjustment of the baking temperature is mainly to consider the sulfur system Due to the special properties of glass, the softening temperature of glass is 150°C and its thermal expansion coefficient is much higher than that of conventional materials. Therefore, during the coating process, the temperature in the vacuum chamber should be kept as stable as possible at around 150°C, taking i...

Embodiment 3

[0050] This embodiment is further optimized on the basis of any of the above-mentioned embodiments, and the same parts as the aforementioned technical solutions will not be repeated here. Further, in order to better realize the present invention, the following setting methods are adopted in particular: the step 2 ) includes the following specific steps:

[0051] 2.1) Clean the vacuum chamber, add the film material required for coating, check the activity of the crystal control plate, clean the chalcogenide glass substrate and put it into the vacuum chamber; that is, first clean the vacuum chamber, add the film material required for coating, and check the activity of the crystal control plate , soak and clean the chalcogenide glass substrate with a mixed solution of alcohol and ether 1:1, then wipe it clean with a dust-free cloth, and then put it directly on the workpiece disk lens fixture in the vacuum chamber after wiping clean;

[0052] 2.2) Close the vacuum chamber, evacuat...

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Abstract

The invention discloses a coating process effectively improving the firmness of a chalcogenide glass coating film. A vacuum chamber is adopted for coating processing of chalcogenide glass; before melting starts, the vacuum chamber is kept at a constant temperature for 30 min or longer under the condition of 120-130 DEG C; in the processes of cleaning a chalcogenide glass substrate with an ion source and performing coating of a transition layer film under the assistance of an ion source, ion energy parameters including the voltage of 240-280 V and the current of 7-10 A are adopted; and after coating is finished, a step cooling method is adopted for cooling. During coating, parameter optimization is performed on the basis of not changing a film system structure to solve the problem that thechalcogenide glass is liable to film peeling.

Description

technical field [0001] The invention relates to the fields of optical thin film preparation technology and the like, specifically, a coating process for effectively improving the firmness of the chalcogenide glass coating film layer. Background technique [0002] With the development of aerospace science and technology and the application of infrared technology, higher and higher requirements are put forward for infrared materials. For example, infrared thermal imaging systems and infrared guidance systems need to work in a wide spectral band. Among many infrared optical materials , chalcogenide glass has attracted much attention due to its excellent optical properties and relatively good chemical stability: (1) Wide transmission band: covering the 1064nm laser band and the commonly used 1-3μm, 3-5μm and 8-12μm Three important infrared bands; (2) Relatively stable chemical properties, excellent acid resistance; (3) Excellent temperature characteristics, low temperature coeff...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/02C23C14/30C23C14/26C23C14/18C23C14/06C23C14/54
CPCC23C14/022C23C14/0629C23C14/0694C23C14/18C23C14/26C23C14/30C23C14/541C23C14/542
Inventor 鲍刚华罗云峰卢成王伟张勇军
Owner CHENGDU GUOTAI VACUUM EQUIP CO LTD
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