Connecting structure, connecting method and application of quartz tuning fork and base
A technology of quartz tuning fork and connection structure, which is applied in the direction of speed measurement by gyro effect, gyroscope/steering sensing equipment, measuring device, etc., which can solve the problems of thermal expansion coefficient mismatch, thermal stress, and gas release, etc., to ensure acceptable , reduce stress, reduce the effect of displacement
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Embodiment 1
[0056] This embodiment provides a method for connecting a quartz tuning fork to a base, such as Figure 1-Figure 6 As shown, it specifically includes the following steps:
[0057] (1) On the central island 11 of the quartz tuning fork 1, magnetron sputtering is used to sequentially deposit a 20nm Cr layer 31 and a 6000nm first Au layer 32;
[0058] (2) The structure obtained in step (1) is precisely defined by using a photolithography process, so that the area corresponding to the target structure is covered by photoresist;
[0059] (3) A wet etching process is adopted for the Cr layer 31 and the first Au layer 32, and after the etching is completed, the photoresist is removed to form a target pattern;
[0060] (4) Precisely define the structure obtained in step (3) by photolithography, so that the region corresponding to the target structure is not covered by photoresist;
[0061] (5) adopt thermal evaporation to deposit the second Au layer 34 of the Sn layer 33 of 4000nm a...
Embodiment 2
[0073] This embodiment provides a method for connecting a quartz tuning fork to a base, such as Figure 1-Figure 6 As shown, it specifically includes the following steps:
[0074] (1) On the central island 11 of the quartz tuning fork 1, magnetron sputtering is used to sequentially deposit a 19nm Cr layer 31 and a 6300nm first Au layer 32;
[0075] (2) The structure obtained in step (1) is precisely defined by using a photolithography process, so that the area corresponding to the target structure is covered by photoresist;
[0076] (3) A wet etching process is adopted for the Cr layer 31 and the first Au layer 32, and after the etching is completed, the photoresist is removed to form a target pattern;
[0077] (4) Precisely define the structure obtained in step (3) by photolithography, so that the region corresponding to the target structure is not covered by photoresist;
[0078] (5) adopt thermal evaporation to deposit the second Au layer 34 of the Sn layer 33 of 4200nm a...
Embodiment 3
[0090] This embodiment provides a method for connecting a quartz tuning fork to a base, such as Figure 1-Figure 6 As shown, it specifically includes the following steps:
[0091] (1) On the central island 11 of the quartz tuning fork 1, magnetron sputtering is used to sequentially deposit a Cr layer 31 of 21 nm and a first Au layer 32 of 5700 nm;
[0092] (2) The structure obtained in step (1) is precisely defined by using a photolithography process, so that the area corresponding to the target structure is covered by photoresist;
[0093] (3) A wet etching process is adopted for the Cr layer 31 and the first Au layer 32, and after the etching is completed, the photoresist is removed to form a target pattern;
[0094] (4) The structure obtained in step (3) is precisely defined by photolithography technology, so that the region corresponding to the target structure is not covered by photoresist;
[0095] (5) adopt the second Au layer 34 of the Sn layer 33 of thermal evaporat...
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