A kind of antistatic wafer cutting protective film and preparation method thereof
A protective film and anti-static technology, which is applied in the direction of circuits, electrical components, film/sheet adhesives, etc., can solve the problem of inability to achieve high-accuracy fixing and efficient picking, contamination of attached objects, and peeling off Low strength peel strength and other problems, to improve the effect of fixing and picking efficiency
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[0042] A second aspect of the present invention provides a method for preparing the antistatic wafer dicing protective film, comprising the following steps:
[0043] (1) the first antistatic layer is bonded to one side of the substrate film, and the second antistatic layer is bonded to the other side of the substrate film;
[0044] (2) Coating the raw materials of the adhesion-reducing layer on the surface of the second antistatic layer, pre-baking, laminating with the release film layer, and curing to obtain the wafer dicing protective film.
[0045] Preferably, the preparation method of the antistatic wafer cutting protection film comprises the steps of:
[0046] (1) Laminate the first antistatic layer with the substrate film, and then with the second antistatic layer;
[0047] (2) Coating the treated raw material of the adhesion-reducing layer on the surface of the second antistatic layer, pre-baking, laminating with the release film layer, and curing to obtain the wafer d...
Embodiment 1
[0052] Embodiment 1 of the present invention provides an antistatic wafer dicing protective film, which sequentially includes a first antistatic layer, a substrate layer, a second antistatic layer, an adhesion-reducing layer, and a release film layer;
[0053] The debonding layer includes the following raw materials in parts by weight: 22 parts of acrylate monomers, 11 parts of acrylate oligomers containing active reactive groups, 1.0 parts of photoinitiators, 5 parts of fillers and 26 parts of solvents;
[0054] The acrylate monomers are butyl acrylate, lauric acrylate and 1,4-butanediol diacrylate, and the molar ratio of butyl acrylate, lauric acrylate and 1,4-butanediol diacrylate is 1: 0.21:0.32;
[0055] The raw materials for the preparation of the acrylate oligomer containing active reactive groups include hydroxyl-containing acrylate monomers and polyisocyanates, and the molar ratio of the hydroxyl groups in the hydroxyl-containing acrylate monomers to the isocyanate gr...
Embodiment 2
[0069] Embodiment 2 of the present invention provides an antistatic wafer dicing protective film, which sequentially includes a first antistatic layer, a substrate layer, a second antistatic layer, an adhesion-reducing layer, and a release film layer;
[0070] The debonding layer includes the following raw materials in parts by weight: 38 parts of acrylate monomers, 19 parts of acrylate oligomers containing active reactive groups, 4.0 parts of photoinitiators, 15 parts of fillers and 53 parts of solvents;
[0071] The acrylate monomers are butyl acrylate, lauric acrylate and 1,4-butanediol diacrylate, and the molar ratio of butyl acrylate, lauric acrylate and 1,4-butanediol diacrylate is 1: 0.35:0.49;
[0072] The raw materials for the preparation of the acrylate oligomer containing active reactive groups include hydroxyl-containing acrylate monomers and polyisocyanates, and the molar ratio of the hydroxyl groups in the hydroxyl-containing acrylate monomers to the isocyanate g...
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