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Repairing and nourishing mask containing carboxylated chitosan and preparation method of repairing and nourishing mask

A technology of carboxylated chitosan and facial mask, which is applied in the direction of cosmetic preparations, skin care preparations, cosmetics, etc., and can solve the problem of people who cannot effectively repair and nourish facial masks and are not suitable for sensitive skin. There are no problems such as good dispersion and homogeneity, achieving excellent repair effects, promoting wound healing, and fast onset effects

Inactive Publication Date: 2020-08-07
GUIZHOU YANGSHENG MEDICAL INSTR
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] At present, there are many types of facial masks on the market, especially the facial masks that have emerged in recent years with the main function of repairing and nourishing. However, most of the ingredients contain repairing and nourishing ingredients, which are not suitable for people with sensitive skin. Long-term use is prone to Allergic reaction, the preparation process is only to mix and stir at different temperatures according to the characteristics of each component, the components are not well dispersed and homogeneous, and cannot effectively play the role of repairing and nourishing mask

Method used

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  • Repairing and nourishing mask containing carboxylated chitosan and preparation method of repairing and nourishing mask
  • Repairing and nourishing mask containing carboxylated chitosan and preparation method of repairing and nourishing mask
  • Repairing and nourishing mask containing carboxylated chitosan and preparation method of repairing and nourishing mask

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Embodiment 1

[0029] Embodiment 1: a kind of repairing nourishing mask containing carboxylated chitosan is made up of cupro ammonia fiber film cloth and facial mask essence, and facial mask essence is made up of the raw material of following parts by weight:

[0030] 0.15 parts of carboxylated chitosan, 0.1 parts of sodium hyaluronate, 0.01 parts of enzyme-cleaved oligomeric hyaluronate, 0.1 parts of sodium alginate, 0.1 parts of ceramide, 1 part of glycerin, 0.1 parts of butylene glycol, phenoxyethanol 0.1 part, 0.01 part of ethylhexylglycerin, 0.05 part of chlorphenesin, 93 parts of purified water.

[0031] The preparation method of the described carboxylated chitosan-containing repairing and nourishing facial mask comprises the following steps: (1) taking each raw material component by weight, for subsequent use; (2) taking 8 parts of purified water, heating to 70°C, add chlorphenesin, stir for 2 minutes until completely dissolved, and obtain Liquid A; (3) After Liquid A is cooled to 55°...

Embodiment 2

[0033] A repairing and nourishing mask containing carboxylated chitosan, which is composed of cupro ammonia fiber film cloth and mask essence, and the mask essence is composed of the following raw materials in parts by weight: 0.3 parts of carboxylated chitosan, hyaluronic acid 0.18 parts of sodium, 0.02 parts of enzyme-cut oligomeric hyaluronate, 0.4 parts of sodium alginate, 0.3 parts of ceramide, 2 parts of glycerin, 0.3 parts of butanediol, 0.3 parts of phenoxyethanol, 0.03 parts of ethylhexylglycerin, chlorine 0.1 part of phenesin, 96 parts of purified water.

[0034] The preparation method of the described carboxylated chitosan-containing repairing and nourishing facial mask comprises the following steps: (1) taking each raw material component by weight, for subsequent use; (2) taking 9 parts of purified water, heating to 73°C, add chlorphenesin, stir for 3 minutes until completely dissolved, and obtain Liquid A; (3) After liquid A is cooled to 58°C, add sodium hyalurona...

Embodiment 3

[0036] A repairing and nourishing mask containing carboxylated chitosan, which is composed of cupro ammonia fiber film cloth and mask essence, and the mask essence is composed of the following raw materials in parts by weight: 0.6 parts of carboxylated chitosan, hyaluronic acid 0.3 parts of sodium, 0.1 parts of enzyme-cleaved oligomeric hyaluronate sodium, 0.6 parts of sodium alginate, 0.5 parts of ceramide, 4 parts of glycerin, 0.5 parts of butanediol, 0.5 parts of phenoxyethanol, 0.1 parts of ethylhexylglycerin, chlorine 0.3 parts of phenesin, 98 parts of purified water.

[0037] The preparation method of the described carboxylated chitosan-containing repairing and nourishing facial mask comprises the following steps: (1) taking each raw material component by weight, for subsequent use; (2) taking by weighing 10 parts of purified water, heating to 75°C, add chlorphenesin, stir for 5 minutes until completely dissolved, and obtain Liquid A; (3) After Liquid A is cooled to 60°C, ...

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Abstract

The invention discloses a repairing and nourishing mask containing carboxylated chitosan and a preparation method of the repairing and nourishing mask. The repairing and nourishing mask containing carboxylated chitosan consists of a facial mask cloth and facial mask essence, and the facial mask essence is prepared from the following raw materials in parts by weight: 0.15 to 0.6 part of carboxylated chitosan, 0.1 to 0.3 part of sodium hyaluronate, 0.01 to 0.1 part of enzyme digestion oligomeric sodium hyaluronate, 0.1 to 0.6 part of sodium alginate, 0.1 to 0.5 part of ceramide, 1 to 4 parts ofglycerol, 0.1 to 0.5 part of butanediol, 0.1 to 0.5 part of phenoxyethanol, 0.01 to 0.1 part of ethylhexylglycerol, 0.05 to 0.3 part of chlorphenesin and 93 to 98 parts of purified water. During preparation, a solution is homogenized and dispersed through a colloid mill, the production time is shortened, and the production cost is reduced. Carboxylated chitosan and sodium hyaluronate are combined,the skin self-repairing capacity is improved, and efficient moisturizing is achieved.

Description

technical field [0001] The invention belongs to the technical field of cosmetics, and specifically relates to a carboxylated chitosan-containing repairing and nourishing mask, and also relates to a preparation method of the carboxylated chitosan-containing repairing and nourishing mask. Background technique [0002] With the continuous improvement of living standards, repairing and nourishing facial masks are widely used as beauty and skin care products. As an important part of the facial mask, repairing and nourishing facial mask essence directly affects the effect of the product, but the existing facial mask essence mainly plays a role in repairing and moisturizing the epidermis, and the repairing and moisturizing effect is poor, which is far from meeting people's needs. [0003] Sodium hyaluronate is the main component of the current repairing moisturizing mask, which has the functions of moisturizing, nourishing, repairing and preventing skin damage, lubricating and film...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): A61K8/73A61K8/68A61K8/49A61K8/34A61K8/02A61P17/02A61Q17/00A61Q19/00
CPCA61K8/733A61K8/735A61K8/736A61K8/68A61K8/345A61K8/4946A61K8/34A61K8/0212A61Q19/00A61Q17/005A61P17/02
Inventor 黄昌平郑茂鑫田静姚关花李荣恒吴丹
Owner GUIZHOU YANGSHENG MEDICAL INSTR