Iron-cobalt-tantalum alloy sputtering target material and preparation method thereof

A sputtering target, tantalum alloy technology, applied in sputtering coating, metal processing equipment, metal material coating technology and other directions, can solve the problems of difficult product machining, high product hardness, generation of pores, etc. The effect of mass production, low gas impurity content and low cost

Pending Publication Date: 2020-08-21
KONFOONG MATERIALS INTERNATIONAL CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

The manufacturing method belongs to the vacuum hot-pressing sintering method. Although the process is simple, it is easy to cause the problem of brittleness and hardness of the product, which makes the product hardness very high, which makes the product machining difficult and increases the cost; CN102560219A discloses a new type of vertical magnetic The manufacturing method of the alloy target material FeCoTaZr for the soft magnetic b...

Method used

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  • Iron-cobalt-tantalum alloy sputtering target material and preparation method thereof

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preparation example Construction

[0064] figure 1 A flowchart showing the method for preparing an iron-cobalt-tantalum alloy sputtering target provided by the present invention specifically includes the following steps:

[0065] (1) Pack the iron-cobalt-tantalum alloy powder with the target atomic ratio into the mold and seal it, and carry out vibration treatment;

[0066] (2) the mold after step (1) is shaken is carried out degassing process;

[0067] (3) hot isostatic pressing the mold degassed in step (2) at 750-900° C. to obtain a crude iron-cobalt-tantalum alloy sputtering target;

[0068] (4) Machining the crude iron-cobalt-tantalum alloy sputtering target material obtained in step (3), and then performing quality inspection and size inspection of density, bending strength, magnetic flux, oxygen content, and obtaining qualified iron-cobalt Tantalum Alloy Sputtering Target.

[0069] For ease of understanding the present invention, the present invention enumerates embodiment as follows:

Embodiment 1

[0071] This embodiment provides a method for preparing an iron-cobalt-tantalum alloy sputtering target, the preparation method comprising the following steps:

[0072] (1) The iron-cobalt-tantalum alloy powder of the target atomic ratio is prepared by gas atomization method, wherein the atomic ratio of Co is 28%, the atomic ratio of Ta is 17%, and the atomic ratio of Fe is 55%, and then loaded into the pre-cleaned The stainless steel sheath is sealed and sealed. The stainless steel cover plate and the sheath are welded by argon arc welding for sealing and vibration treatment. The vibration time is 3min, the vibration amplitude is 10mm, and the vibration frequency is 50 times / min;

[0073] (2) Put the vibrated mold in step (1) into a heating furnace, heat it to 300°C, and control the vacuum degree below 5.0E-3Pa, and perform a degassing treatment for 8 hours;

[0074] (3) Put the mold degassed in step (2) into a hot isostatic pressing furnace, first carry out cold pressurized...

Embodiment 2

[0077] This embodiment provides a method for preparing an iron-cobalt-tantalum alloy sputtering target, the preparation method comprising the following steps:

[0078] (1) The iron-cobalt-tantalum alloy powder of the target atomic ratio is prepared by gas atomization method, wherein the atomic ratio of Co is 28.5%, the atomic ratio of Ta is 18%, and the atomic ratio of Fe is 53.5%, and then loaded into the pre-cleaned The stainless steel sheath is sealed and sealed. The stainless steel cover plate and the sheath are welded by argon arc welding for sealing and vibration treatment. The vibration time is 5min, the vibration amplitude is 8mm, and the vibration frequency is 150 times / min;

[0079] (2) Put the vibrated mold in step (1) into a heating furnace, heat to 450°C, and control the vacuum degree below 5.0E-3Pa, and perform degassing treatment for 6 hours;

[0080](3) Put the mold degassed in step (2) into a hot isostatic pressing furnace, first carry out cold pressurized s...

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Abstract

The invention relates to an iron-cobalt-tantalum alloy sputtering target material and a preparation method thereof. The preparation method comprises the steps of (1) loading iron-cobalt-tantalum alloypowder with a target atomic ratio into a die, then sealing the die, and carrying out tap compaction treatment; (2) degassing the die subjected to the tap compaction treatment; (3) carrying out hot isostatic pressing treatment on the degassed die under 750-900 DEG C to obtain a crude product of the iron-cobalt-tantalum alloy sputtering target material; and (4) machining the obtained crude productof the iron-cobalt-tantalum alloy sputtering target material to obtain the iron-cobalt-tantalum alloy sputtering target. The preparation method has the advantages of simple process, low cost and the like; and in addition, the prepared iron-cobalt-tantalum alloy sputtering target material not only has the density of 98% or above, the bending strength of 700 MPa or above, the magnetic flux of 30% orabove and the oxygen content of 600 ppm or below, but also has good machining performance.

Description

technical field [0001] The invention relates to the field of target material and target material preparation, in particular to an iron-cobalt-tantalum alloy sputtering target material and a preparation method thereof. Background technique [0002] With the rapid development of society and the sharp increase in people's demand for information storage, more and more attention has been paid to recording media such as hard disks and optical discs using magnetic information storage technology, and relying on their advantages such as high storage density, large capacity and low price, It occupies a pivotal position in the field of information storage. Magnetic recording is a way of recording information by using the properties of magnetism. It can input and read information through special methods during storage and use, so as to achieve the purpose of storing information and reading information. According to the position relationship between the magnetization direction of the me...

Claims

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Application Information

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IPC IPC(8): C23C14/34B22F9/08B22F1/00B22F3/093B22F3/03B22F3/14B22F3/15B22F5/00C22C27/02
CPCC23C14/3414B22F9/082B22F3/093B22F3/03B22F3/14B22F3/15B22F5/00C22C27/02B22F2009/0824B22F2998/10B22F2999/00B22F1/065B22F2201/20
Inventor 姚力军赵泽良潘杰王学泽马国成
Owner KONFOONG MATERIALS INTERNATIONAL CO LTD
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