High-performance super-junction structure IGBT structure and method thereof
A high-performance, p-type technology, used in electrical components, circuits, semiconductor devices, etc., can solve problems such as increasing manufacturing difficulty and cost, increasing device turn-off loss, and long device turn-off time, reducing on-resistance and The effect of forward voltage drop, reduced power consumption, and small turn-on voltage drop
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[0031] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention.
[0032] Refer to attached Figure 1-10 As shown, a p-type buffer 2 is arranged above the collector 11, an n-type buffer 3 is arranged above the p-type buffer 2, and an n+ type drift region is arranged above the n-type buffer 3 4. The inside of the n+ type drift region 4 is provided with a p-type block 5, the p-type block 5 is arranged on both sides of the interior of the n+ type drift region 4, and the top of the n+ type drift region 4 is provided with a second An etching trench 12, the bottom of the first etching trench 12 is provided with a second etching trench 13, the inside of the second etching trench 13 is provided with a p-type drain mesh block 6, and the firs...
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