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Heating device for chemical plating auxiliary tank and plating tank system with heating device

A heating device and chemical plating tank technology, applied in liquid chemical plating, metal material coating process, coating, etc., can solve problems such as low efficiency, potential safety hazards of operators, and impact on enterprise production efficiency

Active Publication Date: 2020-10-02
VICHNET COMM SCI & TECH +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] The existing chemical cleaning technology is that the liquid supply system transports the chemical cleaning liquid in the ton barrel to the tank body, and chemically cleans the tank body. The deposited nickel layer on the tank wall and tank bottom is often difficult to clean, and it needs to be manually cleaned in the tank. Thorough cleaning, the chemical cleaning fluid itself has a certain degree of corrosiveness, which poses serious safety hazards to the personal safety of operators, and this method of cleaning workers has poor working environment, low cleaning speed, low efficiency, low safety, and affects enterprises. Production efficiency, but if the plating tank is not cleaned in time, the deposited nickel layer will make the deposition phenomenon more and more serious, which will lead to more and more consumption of nickel ions, resulting in unnecessary waste

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  • Heating device for chemical plating auxiliary tank and plating tank system with heating device
  • Heating device for chemical plating auxiliary tank and plating tank system with heating device
  • Heating device for chemical plating auxiliary tank and plating tank system with heating device

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Embodiment Construction

[0026] The following describes the application in further detail through specific embodiments in conjunction with the accompanying drawings, but the application is not limited to the following embodiments.

[0027] as attached image 3 Shown: a heating device for the chemical plating auxiliary tank, the device includes a movable support 1 placed in the auxiliary tank a2, the movable support 1 is a plastic support (usually polytetrafluoroethylene), so that the surface will not cause nickel It is easy to clean, and the heating tube 2 is spirally wound on the movable support, and there is a gap between the wound heating tubes 2. Usually, the gap between two adjacent heating tubes is equal to the diameter of the heating tube 2, then The contact between the heating tube 2 and the plating solution is more sufficient, and it can also avoid the noise caused by uniform overheating when the heating tube 2 is closely attached and the deposition of the plating solution is more serious. Th...

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Abstract

The invention provides a heating device for a chemical plating auxiliary tank. The device includes a movable support frame arranged in an auxiliary tank, a plurality of heating pipes are arranged on the movable support frame in a winding mode, gaps are left between the heating pipes, the heating pipes are evenly distributed on a side wall of the movable support frame, and the movable support frameis not in contact with an inner circumferential wall of the auxiliary tank. The invention further provides a novel chemical plating tank system including a plating tank and a fluid infusion device, the plating tank includes a main tank and an auxiliary tank, a medicine liquid pipeline and an alkali liquor pipeline are arranged in the main tank, a heating device and a pipeline communicating with acirculation system are arranged in the auxiliary tank, and a high temperature resistance and acid and alkali resistance PE bag sleeves the auxiliary tank. An output port of a liquid storage containeris connected with an input port of a metering pump, an input port of the main tank is connected with a physical output port of an flowmeter, an output port of the auxiliary tank and an input port ofthe plating tank are connected through an overflow downcomer, the flowmeter connected with a PLC control electric box is arranged on the outside of the auxiliary tank, and the system has the characteristics that the cleaning is convenient and the heating is even.

Description

technical field [0001] The present application relates to the technical field of electroless plating wastewater treatment, in particular to a heating device for an auxiliary chemical plating tank and a plating tank system containing the heating device. Background technique [0002] Electroless plating, also known as electroless plating, is a plating method that reduces metal ions in the plating solution to metal and deposits them on the surface of various materials or parts with the help of a suitable reducing agent without an external current. Electroless nickel plating is a Ni-P amorphous coating formed by the reaction of nickel salt and hypophosphite. It has the advantages of no external power supply, uniform coating, high hardness, good wear resistance, and no size and shape restrictions on plated parts. It is widely used In the field of surface treatment technology for electronics, chemicals, machinery and other products. But be nickel source with nickel sulfate hexahy...

Claims

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Application Information

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IPC IPC(8): C23C18/16C23C18/36
CPCC23C18/1628C23C18/1676C23C18/1626C23C18/1683C23C18/1617C23C18/36
Inventor 俞波闻丽君叶继春盛江邹子玉张修飞王泽明
Owner VICHNET COMM SCI & TECH