Serum-free medium for HEK293 cells

A serum-free medium and cell technology, applied in the field of cell culture

Inactive Publication Date: 2020-10-20
SHANGHAI OPM BIOSCI CO LTD
View PDF9 Cites 8 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] At present, there is a lack of a HEK293 cell serum-free medium that can significantly increase pro

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Serum-free medium for HEK293 cells
  • Serum-free medium for HEK293 cells
  • Serum-free medium for HEK293 cells

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0189] Example 1: Preparation of serum-free medium for HEK293 cells

[0190] Serum-free medium for HEK293 cells was prepared according to the following formula, and the preparation method was a conventional preparation method in the art.

[0191]

[0192]

[0193]

Embodiment 2

[0195] Serum-free medium for HEK293 cells was prepared according to the following formula, and the preparation method was a conventional preparation method in the art.

[0196]

[0197]

[0198]

Embodiment 3

[0200] Serum-free medium for HEK293 cells was prepared according to the following formula, and the preparation method was a conventional preparation method in the art.

[0201]

[0202]

[0203]

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
Titeraaaaaaaaaa
Titeraaaaaaaaaa
Titeraaaaaaaaaa
Login to view more

Abstract

The invention discloses a serum-free medium for HEK293 cells. The serum-free medium for the HEK293 cells is prepared from following multiple components or comprises following multiple components: aluminium chloride, barium acetate, biotin, cadmium chloride, calcium pantothenate, choline chloride, cobalt chloride, copper chloride, glucose, cholamine, ferric nitrate, folic acid, glutathione, 4-(2-hydroxyethyl)piperazine-1-ethanesulfonic acid, inositol, arginine, asparaginate, aspartic acid, cysteine, glutamic acid and the like. Compared with the existing culture medium, the serum-free medium forthe HEK293 cells can increase the expression quantity obviously and more antibodies or proteins can be obtained in a shorter time.

Description

technical field [0001] The invention relates to the technical field of cell culture, and more specifically, to a serum-free culture medium for HEK293 cells and its application. Background technique [0002] HEK293 cells are an important platform for antibody and recombinant protein expression. According to the time of expression, gene product expression can be divided into transient expression and stable expression. Stable expression is the gold standard for antibody drug production systems, but the process is time-consuming and expensive, which is not conducive to high-throughput and high-efficiency screening of new antibody drugs. Transient gene expression technology means that after the exogenous gene enters the recipient cell, it exists on the free carrier and does not integrate into the chromosome. The expression product of the target gene can be obtained in a relatively short period of time. However, as the cell divides and proliferates, this The exogenous gene event...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): C12N5/073C12N5/10
CPCC12N5/0603C12N5/0686C12N2500/12C12N2500/14C12N2500/16C12N2500/20C12N2500/22C12N2500/24C12N2500/32C12N2500/34C12N2500/35C12N2500/38C12N2500/46C12N2500/60C12N2500/90C12N2501/999C12N2510/02
Inventor 肖志华
Owner SHANGHAI OPM BIOSCI CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products