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Filtering device and vacuumizing system

A technology of filtering device and vacuuming device, which is applied in the fields of filtration of dispersed particles, separation of dispersed particles, chemical instruments and methods, etc., can solve the problems of dry pump blockage, limited filtration capacity, and filtration effect affecting the optimization and upgrading of vacuum pump equipment. Pollution, good filtering effect

Pending Publication Date: 2020-11-24
NINGXIA LONGI SILICON MATERIALS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

If the filtration capacity of the previous process is limited, the volatile impurities that are not completely filtered out will easily cause the blockage of the dry pump
Therefore, the filtering effect is still the bottleneck affecting the optimization and upgrading of vacuum pump equipment

Method used

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  • Filtering device and vacuumizing system
  • Filtering device and vacuumizing system
  • Filtering device and vacuumizing system

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0035] refer to figure 1 , a filter device mainly includes a cleaning mechanism 1, a filter unit, a filter unit fixing plate 3, a tank body 4 and a power system 5. The cleaning mechanism 1 , the filter unit and the filter unit fixing plate 3 are arranged inside the tank body 4 , and the filter unit is arranged on the filter unit fixing plate 3 .

[0036] refer to image 3 , the filter unit includes at least one filter bag 2, the filter bag 2 is cylindrical, and is used to filter the dust discharged from the single crystal furnace. Preferably, the PTFE-coated dust-removing cloth bag can filter the volatiles in the crystal pulling tail gas well while ensuring the air flow, and the filtration efficiency is ≥99.99%.

[0037] refer to Figure 1-2 , The cleaning mechanism 1 is provided with a beating plate 13, and a filter bag 2 is arranged in the range of the beating plate 13 rotation, and the beating plate 13 collides with the filter bag 2, and the bag body of the filter bag 2 ...

Embodiment 2

[0085] A vacuum system for vacuuming a single crystal furnace, comprising a vacuum device and the filter device described in any one of Embodiment 1, the filter device is connected between the single crystal furnace and the vacuum device, and the vacuum device is Oil pump or dry pump.

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PUM

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Abstract

The invention relates to the technical field of single crystal manufacturing, in particular to a filtering device and a vacuumizing system. The filtering device comprises a tank body, a filtering unitand an ash removing mechanism, wherein the ash removing mechanism and the filtering unit are located in the tank body; the filtering unit comprises at least one filtering bag; the ash removing mechanism comprises a flapping plate, and the flapping plate collides with the at least one filtering bag through rotation. A dust removing bag is high in filtering effect, volatile matter generated in thecrystal pulling process can be effectively removed by impacting and patting the filtering bag through the ash removing mechanism, it is possible that a dry pump is used in crystal pulling, and for thesituation that an oil pump is used in crystal pulling, pollution of vacuum pump oil can be reduced; and the continuous working time of the vacuum pump is greatly prolonged, so that the continuous operation time of a single crystal furnace is prolonged.

Description

technical field [0001] The invention relates to the technical field of single crystal manufacturing, in particular to a filter device and a vacuum system. Background technique [0002] The Czochralski method is a common single crystal growth method. The growth process is to immerse the seed crystal in the melt in the single crystal furnace, and then implement the steps of seeding, shouldering, shoulder turning, equal diameter and finishing in sequence, and finally obtain a single crystal. boule. While pulling the crystal, introduce protective gas into the furnace and set up a vacuum pump for suction. With the purge effect of the protective gas on the crystal growth environment, impurities such as volatiles and oxides are taken away to ensure the stability of the crystal pulling process and the quality of the finished product. [0003] The protective gas carrying impurities such as volatiles and oxides is the crystal pulling tail gas. Generally, it flows through the filter ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B01D46/02B01D46/04
CPCB01D46/023B01D46/04
Inventor 马守林黄学宁陈立军赵常福李学东兰晓南陆锋
Owner NINGXIA LONGI SILICON MATERIALS