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Method for evaluating photoresist photoetching efficiency based on quartz crystal microbalance

A technology of quartz crystal and photoresist, applied in the direction of using optical devices, using sound waves/ultrasonic waves/infrasonic waves to analyze fluids, instruments, etc., can solve problems such as expensive, time-consuming, and complicated processes

Active Publication Date: 2020-12-25
JIANGSU UNIV
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

The disadvantage of this method is that the operation is complicated. It is necessary to fix the photoresist on the substrate and then record the solubility of the photoresist caused by given different exposures. It requires repeated experiments and the process of measuring the thickness of the residual film. Complex and difficult to operate, unable to achieve real-time evaluation
The traditional method of evaluating photoresist contrast is a time-consuming and expensive process involving many tedious operations such as spin-coating, baking of photoresist film, exposure of photoresist, and photoresist thickness and reflectivity Usually only under certain conditions can accurate measurement results be given

Method used

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  • Method for evaluating photoresist photoetching efficiency based on quartz crystal microbalance
  • Method for evaluating photoresist photoetching efficiency based on quartz crystal microbalance
  • Method for evaluating photoresist photoetching efficiency based on quartz crystal microbalance

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Embodiment 1

[0027]Fix the photoresist on the chip and use 365nm ultraviolet light for photodegradation treatment, so that the positive photoresist AZ1518 cured on the chip is dissolved and separated from the chip surface, such asfigure 1 Shown in (a). The changes of resonance frequency (△F) and energy dissipation (△D) in QCM are collected, and the degradation efficiency of photoresist by ultraviolet light is dynamically monitored in real time, so as to effectively evaluate the sensitivity and contrast of photoresist.

[0028]Specific steps are as follows:

[0029]Step 1: Put the QCM chip in a UV-ozone cleaner for 30 minutes, then clean it with deionized water and ethanol, and then dry it with nitrogen; the QCM with a sunroof is cleaned with deionized water and ethanol and then dry it with nitrogen.

[0030]Step 2: Fix the photoresist; pass the photoresist AZ1518 on the QCM chip under dark conditions, and the photoresist adheres to the surface of the chip to form a thin layer of colloid; then the fixed Q...

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Abstract

The invention provides a method for evaluating photoresist photoetching efficiency based on a quartz crystal microbalance. The method comprises the following steps of: firstly, enabling photoresist topass through a QCM (Quartz Crystal microbalance) chip, and adhering the photoresist to the surface of the chip; then, putting the chip adhered with the photoresist into a light-transmitting module, selecting an irradiation light source to carry out exposure treatment on the photoresist on the surface of the chip, meanwhile, collecting the change of a QCM signal, and determining the sensitivity ofthe photoresist by utilizing a time length between a moment when the signal changes and the exposure treatment; and analyzing the contrast ratio of the photoresist by utilizing a time length betweenthe moment when the signal changes and a moment when the signal becomes constant. The measurement method is simple and convenient, and the contrast ratio and the sensitivity of the photoresist can bedynamically evaluated in real time.

Description

Technical field[0001]The invention relates to the technical field of instrument detection, in particular to a method for evaluating photoresist lithography efficiency based on a quartz crystal microbalance.Background technique[0002]Quartz crystal microbalance (QCM) is an instrument that uses the piezoelectric effect of quartz crystal to detect changes in surface quality; when an external electric field is applied, the crystal will produce mechanical vibration. When the thickness of the quartz crystal is the mechanical electrode Resonance occurs when the half wavelength of the oscillating wave is odd multiples. Regarding the change of the resonance frequency in vacuum (ΔfnThe relationship between) and the average mass change of the surface can be obtained from the Sauerbrey equation.[0003][0004]Where n=1,3,5,7,9,11,13, fnAnd ΔfnIs the n-th order frequency and its change value, and c is a constant, which is about 17.7ng Hz for AT-cut 5MHz QCM chips-1cm-2; QCM is widely used in the res...

Claims

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Application Information

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IPC IPC(8): G01B11/06G01N29/02
CPCG01B11/0666G01N29/022G01N2291/022G01N2291/0426
Inventor 汪杰刘磊董明东
Owner JIANGSU UNIV
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