Description model and parameter identification method for intrinsic characteristic parameters of MOSFET device
A technology for intrinsic characteristics and description models, which is applied in the field of modeling and parameter identification of intrinsic characteristics of power semiconductor components, and can solve problems such as reducing equation complexity, difficult circuit analysis, and complex circuit system modeling.
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[0059] The present invention will be further described below in conjunction with the N-channel MOSFET whose model is IRF640.
[0060] Such as image 3 , Figure 4 As shown, a description model of the intrinsic characteristic parameters of a MOSFET device is a fractional order model based on the bias voltage of the PN junction capacitance Among them: [K,α] is the parameter to be identified, including:
[0061] according to figure 1 , when the MOSFET junction capacitance is in the depletion region under high frequency conditions, the formula for the junction capacitance value is:
[0062]
[0063] where: ε ox is the dielectric constant of the oxide layer, ε s is the dielectric constant of the semiconductor, q is the charge amount of the elementary charge, N A is the doping concentration, d oxide layer thickness, C 0 is the capacitance of the oxide layer, V is the bias voltage;
[0064] For the above formula, usually If the value is larger, formula (1) can be simpli...
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