A movable knife edge device, lithography equipment and lithography method

Abstract

The invention discloses a movable knife-edge device, photolithography equipment and a photolithography method, and belongs to the technical field of photolithography equipment. The movable knife-edge device can reduce the vibration impact on the support unit when the X-direction opening size adjustment unit and the Y-direction opening size adjustment unit move by setting the X-direction vibration elimination unit and the Y-direction vibration elimination unit, thereby reducing the impact on the bearing. The disturbance generated by the mechanical system of the device can improve the stability and reliability of the device when it is working, improve the processing accuracy and product performance; The productivity of lithography equipment. Moreover, the common rail movement of the X1 module and the X2 module and the common rail movement of the Y1 module and the Y2 module simplify the integrated assembly and adjustment process and the device structure, improve the integrated assembly efficiency and device reliability, and reduce costs at the same time.

Description

technical field [0001] The present invention relates to the technical field of lithography equipment, and in particular, to a movable knife edge device, a lithography equipment and a lithography method. Background technique [0002] Large-scale integrated circuit production is the core of modern microelectronics technology, and semiconductor equipment is the basis for the development of integrated circuits. Among the current semiconductor manufacturing equipment, lithography equipment occupies the most important position. After the lithography technology has experienced several development stages of proximity / contact, scanning projection, and stepping projection, the stepping scan projection has developed into the current mainstream technology. [0003] The most important part of a step-and-scan projection lithography machine is the exposure system, which will generate the exposure field of view. During the lithography process, the laser beam of the exposure system project...

AI Technical Summary

Problems solved by technology

[0004] The prior art discloses a multi-blade coplanar variable slit device. Four blades connected end to end and nested in each other are used to form a variable slit. The main problem is that the blades are connected mechanically. When the blade moves, it must drag another blade. When the speed increases, the load becomes larger, causing vibration effects on the frame of the lithography machine, which is not conducive to precision control, and there is no decoupling between the blades, and the application wears intensified under high-speed motion conditions. , the service life is greatly reduced

Since the two layers of cutting edges are not coplanar, in order to ensure the minimum distance between the two layers of cutting edges, the parallelism between each group of cutting edges and the perpendicularity between the cutting edges and the base plate, the machining and assembly accuracy of the four independent axes must be very high. High, the device structure is relatively complex

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