An integrated combination method for high-pressure experimental sample preparation and characterization
A combination method and high-pressure experiment technology, which is applied in the preparation of test samples, the use of stable tension/pressure to test the strength of materials, instruments, etc., can solve the problems of inaccurate control, poor experimental repeatability, and low experimental success rate. Achieve the effect of smooth electrical path, precise and controllable arrangement, and simple operation process
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0125] This embodiment provides a high-pressure experimental sample preparation method. Using the above-mentioned high-pressure experimental sample preparation method, the prepared sample is a SiC film; wherein, the RF magnetron sputtering power is 100W, the argon gas flow rate is 3.2mL / min, and the coating time is 10min.
[0126] In this embodiment, 4 parallel samples were produced with the same process parameters, respectively marked as 1#, 2#, 3#, 4#; the thickness of the 4 parallel samples was tested, and the test results were as follows: Figure 4 As shown, (a), (b), (c), and (d) are schematic diagrams of the results of 1-4# respectively, which are 45.3nm, 46.26nm, 47.2nm, and 46.09nm respectively; it can be seen that the results obtained after different times of coating The thickness is slightly deviated, the average thickness is 46.21nm, the standard deviation is: 1.3nm, and the error percentage is 2.8%. According to the requirements, generally an error of less than 5% ...
Embodiment 2
[0128] This embodiment provides an integrated combination method for high-voltage experimental sample preparation and characterization. Using the above-mentioned integrated combination method for high-voltage experimental sample preparation and characterization, the plated sample is La, and the electrode material is Pt; wherein, the radio frequency magnetron sputtering power is 110W, The flow rate of argon gas is 2mL / min, and the coating time is 5min.
[0129] In this example, 2 parallel samples were produced using the same process parameters, and the 2 parallel samples were electrically tested, and the resistance deviation at a temperature of 280K was taken. The test results are as follows Figure 5 It can be seen that the error of the resistance data of the two parallel samples of the present invention is less than 3%. It can be seen that the high-voltage experimental sample preparation and characterization integrated combination method of the present invention has good repea...
PUM
Property | Measurement | Unit |
---|---|---|
thickness | aaaaa | aaaaa |
diameter | aaaaa | aaaaa |
thickness | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com