Preparation method and application of Co3O4 nano porous cathode coating
A cathodic coating and nanoporous technology, applied in coatings, metal material coating processes, electrodes, etc., to reduce costs, avoid performance degradation, and achieve good social and economic benefits
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Embodiment 1
[0030] Take a piece of Raney nickel as the substrate, wash it with a mixture of water and ethanol, and dry it for use. Will Co 3 o 4 Mix with Al according to the mass ratio of 1:0.5, take 5g of the mixture and coat it on the magnetron sputtering target, Co 3 o 4 The mixture with Al was coated on the substrate by rotary sputtering, the time was 5min, and the sputtering current was 10A to form a dense mixture coating, and then coated with N 2 Perform purging; prepare a NaOH solution with a concentration of 3M, take 100ml of the solution in a beaker, immerse the coated Raney nickel in the beaker for etching, continue magnetic stirring for 3 hours, and heat at 40°C; after etching Clean the Raney nickel, put the Raney nickel in a clean beaker, add deionized water, and then put it in the ultrasonic pool for ultrasonic operation, the ultrasonic power is 350W, the time is 5min, and then the Raney nickel is taken out , replace the deionized water in the beaker, repeat the above cle...
Embodiment 2
[0033] Take a piece of Raney nickel as the substrate, wash it with a mixture of water and ethanol, and dry it for use. Will Co 3 o 4 Mix with Al according to the mass ratio of 3:2, take 5g of the mixture and coat it on the magnetron sputtering target, and Co 3 o 4 The mixture with Al was coated on the substrate by rotary sputtering, the time was 15min, and the sputtering current was 13A to form a dense mixture coating, and then coated with N 2 Perform purging, prepare a NaOH solution with a concentration of 5M, take 100ml of the solution in a beaker, immerse the coated Raney nickel in the beaker for etching, continue magnetic stirring for 3 hours, and heat at 60°C. Clean the Raney nickel, put the Raney nickel in a clean beaker, add deionized water, and then place it in the ultrasonic pool for ultrasonic operation, the ultrasonic power is 500W, the time is 7min, and then the Raney nickel is taken out , replace the deionized water in the beaker, repeat the above cleaning ope...
Embodiment 3
[0036] Take a piece of Raney nickel as the substrate, wash it with a mixed solution of water and ethanol, and dry it for use. Will Co 3 o 4 Mix with Al according to the mass ratio of 1:5, take 5g of the mixture and coat it on the magnetron sputtering target, and Co 3 o 4 Sputter with Al on the substrate, time 20min, sputtering current 20A, form a dense mixture coating, and then use N 2 Perform purging, prepare NaOH solution with a concentration of 8M, take 100ml of the solution in a beaker, immerse the coated Raney nickel in the beaker for etching, continue magnetic stirring for 3 hours, and heat at 80°C. Clean the Raney nickel, put the Raney nickel in a clean beaker, add deionized water, and then place it in the ultrasonic pool for ultrasonic operation, the ultrasonic power is 700W, the time is 10min, and then the Raney nickel is taken out , replace the deionized water in the beaker, repeat the above cleaning operation 8 times, and then dry it in an oven at 80°C for 12h, ...
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