Color film developing solution and preparation method thereof
A developing solution and color film technology, applied in the field of developing solution, can solve the problems of metal ions and other impurities residue, incomplete development, metal ion impurities, particles or undissolved residues, etc., to improve the residue problem and excellent developing performance Effect
Pending Publication Date: 2021-04-23
镇江润晶高纯化工科技股份有限公司
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Problems solved by technology
[0005] The purpose of the present invention is to solve the shortcomings of incomplete development, poor defoaming performance, and easy occurrence of metal ion impurities, particles or undissolved residues in the existing color film developer technology, and provides a simple preparation method. , can improve developability without adding defoamer at the same time, and significantly improve problems such as the residue of impurities such as metal ions
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[0016] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.
[0017] The present invention provides a technical solution: a color film developing solution and a preparation method thereof. Table 1 below shows the developing effect, developing efficiency, and developing effect of commercially available conventional color film developing solution and the color film developing solution of the present invention. Evaluation of residues, etc.: In the yellow light room, the TFT glass substrate with the BM film layer formed is ro...
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The invention discloses a color film developing solution and a preparation method thereof. The color film developing solution is composed of the following components in percentage by weight: 1.0%-25.0% of potassium hydroxide aqueous solution, 1.05%-20.00% of surfactant and the balance of ultra-pure water, is mainly used in R, G and B processes of color filters, and can be used for developing photoresists in a substrate surface. The color film developing solution has good permeability to photoresist, the developing efficiency is greatly improved, meanwhile, the adverse effect of metal ion impurities is weakened, an image presented through developing is free of other residues, and the requirements for high resolution and high image quality in the existing liquid crystal display manufacturing process are met.
Description
technical field [0001] The invention relates to the technical field of developer, in particular to a color film developer and a preparation method thereof. Background technique [0002] With the continuous development of science and technology, liquid crystal displays (LCDs, Liquid Crystal Displas) have been integrated into all aspects around us, directly affecting our quality of life. In 1984, European and American countries proposed STN-LCD (Super Twisted Nematic-LCD) and (Thin Film Transistor-LCD) display technologies; in 1993, after mastering the production technology of thin film transistor liquid crystal display (TFT-LCD) in Japan, high-quality LCD appeared in front of the masses. [0003] TFT-LCD is a passive light-emitting display device. Only under the illumination of the backlight module, TFT-LCD can display images normally, and the colorization of TFT-LCD is realized by color filters. By changing the voltage applied to the liquid crystal panel, the arrangement o...
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Login to View More IPC IPC(8): G03F7/32
CPCG03F7/322
Inventor 乔正收王金城
Owner 镇江润晶高纯化工科技股份有限公司