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103results about How to "Improve residual problems" patented technology

Dual-cylinder tabletop-type selective laser melting molding equipment and dual-cylinder tabletop-type selective laser melting molding method

ActiveCN104550953AAvoid wastingSave recycling timeSelective laser meltingPlatinum
The invention discloses dual-cylinder tabletop-type selective laser melting molding equipment and a dual-cylinder tabletop-type selective laser melting molding method. The dual-cylinder tabletop-type selective laser melting molding equipment comprises a sealed molding chamber, an optical transmission system, a powder spreading device, a molding cylinder and a powder cylinder, wherein a molding platform is arranged on the upper part of the molding cylinder and the powder cylinder; a movable platform is arranged above the molding platform; the molding platform serves as a guide rail of the movable platform, so that the movable platform can move left and right on the molding platform; the molding platform is provided with a powder spreading device and a powder acquiring system; the powder acquiring system comprises a powder acquiring base platform and a powder acquiring barrel, the powder acquiring barrel is arranged on the upper part of the powder acquiring base platform. Aiming at key points of a direct precious metal molding system, namely powder recovering and clearing, the dual-cylinder tabletop-type selective laser melting molding equipment is provided with the powder acquiring structure which can be completely taken out easily, and no powder is remained on the inner corners of the molding cylinder/powder cylinder, so that material wastes in a molding process are reduced, and the dual-cylinder tabletop-type selective laser melting molding equipment can be applied to direct molding of individual parts made of precious metals such as gold, silver and platinum in the bijouterie industry.
Owner:GUANGZHOU LEIJIA TECH CO LTD

High-speed filling machine

ActiveCN113307208ARealize online cleaning and sterilization functionReduce process gap timeSafety device in filling machineryLiquid storage tankElectric machinery
The invention relates to a high-speed filling machine. The high-speed filling machine comprises a workbench and a filling machine body arranged on the workbench. The filling machine body comprises a liquid storage tank, a filling assembly arranged on a liquid outlet of the liquid storage tank, and a control host. The filling assembly comprises a multi-pass rotating connector arranged at the liquid outlet, filling pipes connected to the multi-pass rotating connector, filling needles arranged on the filling pipes, a filling control valve, a filling rotary disc assembly arranged below the filling needles and used for bottle body transferring, a rotating support arranged between the filling rotating disc assembly and the multi-pass rotating connector, and a driving motor driving the rotating support to rotate. The filling rotating disc assembly is provided with filling stations which are distributed in an annular array mode, the filling pipes and the filling stations are arranged in a one-to-one correspondence mode, and the filling needles are located over the filling stations. Filling photoelectric sensing assemblies corresponding to the filling stations are arranged on the rotating support and connected with the data end of the control host, and the filling control valve and the driving motor are controlled by the control host. The high-speed filling machine has the effect of improving the continuity of the high-speed filling production.
Owner:上海拓达机电设备有限公司

Manufacturing method of array substrate

The present invention provides a manufacturing method of an array substrate. The manufacturing method of the array substrate comprises the following steps: providing a substrate; forming a thin film transistor arranged on one side of the substrate; forming a flat layer covering the thin film transistor; forming a photoresist layer covering the flat layer; providing a light cover, wherein the lightcover is provided with a plurality of groove patterns corresponding to the peripheral area of the flat layer, the groove patterns comprises a strip-shaped structure and multiple protruding structures, the strip-shaped structure is used for forming grooves on the flat layer, the strip-shaped structure comprises a first side and a second side opposite to each other, the protruding structures are used for optimizing slope angles of the grooves, each protruding structure comprises a first plane and a second plane opposite to each other, the first planes are arranged on the first side and the second side, and the width of each protruding structure gradually decreases from the first plane to the second plane; exposing the flat layer by using the light cover to form the grooves on the peripheralarea of the flat layer, wherein the slope angles of the grooves are in the range of preset angles. The method can contribute to reducing the slope angles of the grooves on the flat layer.
Owner:WUHAN CHINA STAR OPTOELECTRONICS TECH CO LTD

Method for improving residual microparticles on surface of wafer

PendingCN110400749AImprovement of micro particle residue on the wafer surfaceSolve particle attachmentElectric discharge tubesSemiconductor/solid-state device manufacturingSurface chargesPlasma reaction
The invention provides a method for improving residual microparticles on the surface of a wafer. The method comprises the following steps of firstly, providing a plasma reaction etching cavity and a wafer positioned in the plasma reaction etching cavity, arranging a semiconductor structure on the wafer, and ensuring that the semiconductor structure is in a process state that etching of a first layer of metal groove is finished; secondly, forming a polymer protective layer on the surface of the wafer; thirdly, introducing a plasma source into the plasma reaction etching cavity to remove chargeson the surface of the wafer; and finally, stopping introducing the plasma source, and standing the wafer. According to the invention, after the completion of the groove etching process on the first layer of metal groove, a protective layer is formed on the surface of the wafer by using a gas source for depositing a polymer in the subsequent process. After that, microparticles in the cavity are adsorbed and brought out of the etching cavity by using a macromolecular gas source assisted destaticizing process in the subsequent destaticizing process, so that particle attachments caused in the wafer decharging process are solved.
Owner:SHANGHAI HUALI MICROELECTRONICS CORP

Benziothiazolinone and copper dicarboxylate-containing microcapsule suspension-suspending agent and preparation method thereof

The invention relates to a benziothiazolinone and copper dicarboxylate-containing microcapsule suspension-suspending agent and a preparation method thereof. The preparation method comprises the following steps: S1) uniformly mixing an oily capsule material-containing performed polymer solution and benziothiazolinone missible oil to obtain a first material; S2) mixing the first material and a buffer solution to obtain a second material, wherein a pH value of the second material is 5-7; S3) mixing the second material and an acidic solution to obtain a third material, wherein the pH value of thethird material is 3-5; S4) stirring the third material for 2-6 hours to obtain a fourth material; S5) mixing the fourth material, a first dispersant, a thickening agent and an antifreezing agent to obtain a benziothiazolinone microcapsule suspending agent; and S6) mixing the benziothiazolinone microcapsule suspending agent, a copper dicarboxylate suspending agent, and a second dispersant to obtainthe benziothiazolinone and copper dicarboxylate-containing microcapsule suspension-suspending agent. The benziothiazolinone and copper dicarboxylate-containing microcapsule suspension-suspending agent has the advantages of good stability and excellent drug effect.
Owner:河北赛丰生物科技有限公司

Ultrasonic extraction atomization auxiliary carbon fiber ionization device and method of using same to realize ionization

The invention discloses an ultrasonic extraction atomization auxiliary carbon fiber ionization device and a method of using the same to realize ionization. The device includes a carbon fiber ion source and a mass spectrometry sample input channel. A sampling and ionization end of the carbon fiber ion source is located in front of a port of the mass spectrometry sample input channel. An ultrasonicextraction atomization device is arranged near the sampling and ionization end of the carbon fiber ion source. The method of using the ultrasonic extraction atomization auxiliary carbon fiber ionization device of the invention to realize ionization includes the operations of: placing a sample, which contains an extraction solvent, on the ultrasonic extraction atomization device, then sequentiallycarrying out extraction and atomization on the sample by the ultrasonic extraction atomization device, and then ionizing the atomized sample by the carbon fiber ion source. The ultrasonic extraction atomization auxiliary carbon fiber ionization device provided by the invention has good an ionization effect on peptide compounds, and can qualitatively and quantitatively analyze complex samples without the need for preprocessing the to-be-tested samples.
Owner:SHANGHAI INST OF ORGANIC CHEM CHINESE ACAD OF SCI

Fuel and air separation active control type ignition chamber system

The invention discloses a fuel and air separation active control type ignition chamber system, and relates to the technical field of combustion of internal combustion engines. The system comprises an air supply branch and a fuel supply branch which are arranged at the top of an ignition chamber; the ignition chamber is arranged on a cylinder cover or an ignition chamber adapter single body, the cylinder cover or the ignition chamber adapter single body is provided with a sparking plug, an air channel and a fuel channel, the sparking plug is arranged above the ignition chamber, the air channel and the fuel channel communicate with the ignition chamber, the air supply branch communicates with the air channel, and the fuel supply branch communicates with the fuel channel; pre-combustion air is directly supplied by an air pressure pump or supplied from a bypass arranged in the downstream position of a supercharger of an engine body, and air exchange of the ignition chamber is achieved through the pressure difference between the downstream position of the supercharger and the interior of the cylinder in the later stage of an exhaust stroke or the early stage of an intake stroke. After being stabilized by an air pressure accumulation chamber, the air is supplied to the air nozzle end through a one-way safety valve, active scavenging in the ignition chamber is achieved, and the composition of the mixed gas in the ignition chamber can be controlled in real time, so that the combustion stability and controllability are improved.
Owner:DALIAN UNIV OF TECH

Detection method for simultaneously measuring residue of tetracyclines (TCs) drugs in royal jelly

The invention relates to a detection method for simultaneously measuring the residue of tetracyclines (TCs) drugs in royal jelly, in particular to a detection method for simultaneously measuring the residue of 10 veterinary drugs including oxytetracycline, tetracycline, demethylchlortetracycline, chlorotetracycline, doxycycline, 4- epioxytetracycline, 4-epitetracycline, 4-epichlorotetracycline, minocycline and methacycline. The method comprises the following steps: precipitating protein by methanol; then, adjusting the PH value; further carrying out multi-stage purification; and simply and simultaneously measuring the residue of the TCs drugs by the liquid chromatography-mass spectrometry / mass spectrometer (LC-MS / MS). By carrying out the pre-treatment for one time, the invention can measure the residue of up to 10 TCs drugs in the royal jelly, wherein, the lower limits of detection (LLD) of the five TC antibiotics including oxytetracycline, tetracycline, demethylchlortetracycline, chlorotetracycline and doxycycline are 2.0 mug / kg; while the LLDs of the other veterinary drugs including 4- epioxytetracycline, 4-epitetracycline, 4-epichlorotetracycline, minocycline and methacycline are 10.0 mug / kg.
Owner:THE INSPECTION & QUARANTINE TECH CENT ZHEJIANG ENTRY EXIT INSPECTION & QUARANTINE BUREAU
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