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2091results about How to "Low selectivity" patented technology

High pressure high non-reactive diluent gas content high plasma ion density plasma oxide etch process

The invention is embodied in a method of processing a semiconductor workpiece in a plasma reactor chamber, including supplying a polymer and etchant precursor gas containing at least carbon and fluorine into the chamber at a first flow rate sufficient of itself to maintain a gas pressure in the chamber in a low pressure range below about 20 mT, supplying a relatively non-reactive gas into the chamber at second flow rate sufficient about one half or more of the total gas flow rate into the chamber, in combination with the first flow rate of the precursor gas, to maintain the gas pressure in the chamber in a high pressure range above 20 mT, and applying plasma source power into the chamber to form a high ion density plasma having an ion density in excess of 1010 ions per cubic centimeter. In one application of the invention, the workpiece includes an oxygen-containing overlayer to be etched by the process and a non-oxygen-containing underlayer to be protected from etching, the precursor gas dissociating in the plasma into fluorine-containing etchant species which etch the oxygen-containing layer and carbon-containing polymer species which accumulate on the non-oxygen-containing underlayer. Alternatively, the high pressure range may be defined as a pressure at which the skin depth of the inductive field exceeds {fraction (1 / 10)} of the gap between the inductive antenna and the workpiece.
Owner:APPLIED MATERIALS INC

Rare earth catalyst for catalyzing syn form 1,4-selectivity polymerization of isoprene or butadiene

The invention relates to a rare-earth catalyst for catalyzing selective polymerization of isoprene or butadiene, while the catalyst system composed of the rare-earth catalyst can catalyze isoprene or butadiene to prepare polyisoprene or butadiene rubber with high cis-1, 4- structure. The rare-earth catalyst is composed of split-core type rare-earth complex, alkyl aluminium and organic boron salt. The solvent of polymerization is toluene or chlorobenzene. When catalyzes the polymerization of isoprene, the alkyl aluminium and split-core type rare-earth complex are rationed at 10-40, the organic boron salt and split-core type rare-earth complex are rationed at 1-3, the polymerization temperature is -20-80DEG C, the polymerization time is 0.5-2h, the monomer conversation ratio can reach 100% most, and the cis-1, 4 content of polymer is 55.0-98.8%, and when catalyzes the polymerization of butadiene, the alkyl aluminium and split-core type rare-earth complex are rationed at 10-40, the organic boron salt and split-core type rare-earth complex are rationed at 1-3, the polymerization temperature is -20-80DEG C, the polymerization time is 0.5-2h, the monomer conversation ratio can reach 100% most, and the cis-1, 4 content of polymer is 90.1-99.99%.
Owner:CHANGCHUN INST OF APPLIED CHEMISTRY - CHINESE ACAD OF SCI
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