Manufacturing method of high-precision polycrystalline low resistance
A high-precision, low-resistance technology, applied in the field of MEMS technology, can solve problems such as the inability to guarantee resistance accuracy
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[0021] The invention provides a high-precision polycrystalline low-resistance manufacturing method, the process of which is as follows figure 1 As shown, it specifically includes the following steps:
[0022] Step S11, growing a SiO2 layer on the surface of the substrate;
[0023] Step S12, growing a polysilicon film on the surface of the SiO2 layer;
[0024] Step S13, performing high-temperature annealing on the polysilicon film before implantation;
[0025] Step S14, performing ion implantation on the polysilicon film after high temperature annealing;
[0026] Step S15, growing a SiO2 shielding layer on the surface of the polysilicon film;
[0027] Step S16 , performing post-implantation high temperature annealing.
[0028] Specifically, a layer of SiO2 layer 1 is grown on the surface of the substrate 2 by thermal oxidation, and then a polysilicon film 3 is grown by LPCVD, and the polysilicon film 3 is annealed at a high temperature before implantation, such as figure ...
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