Laser steady-state evaporation coating system and method for high-melting-point material in fusion device

An evaporation coating, high melting point technology, used in vacuum evaporation coating, metal material coating process, sputtering coating and other directions

Active Publication Date: 2021-05-11
HEFEI INSTITUTES OF PHYSICAL SCIENCE - CHINESE ACAD OF SCI +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0005] The technical problem to be solved by the present invention is to provide a system capable of realizing steady-state evaporation of high-melting point materials, which is safe and non-toxic compared to the existing silicification and boronization. , the tail gas treatment is simple; the coating formed on the first wall does not introduce impurities such as hydrogen and carbon

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  • Laser steady-state evaporation coating system and method for high-melting-point material in fusion device

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Embodiment Construction

[0031] The technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of them. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0032] According to an embodiment of the present invention, the present invention describes a laser steady-state evaporation system for high melting point materials (especially silicon and boron materials, melting points are 1414°C and 2180°C respectively) for the preparation of the first wall coating of a fusion device. In general, by adjusting the high energy density of the laser spot within a certain range, it is possible to melt high-melting poi...

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Abstract

The invention discloses a laser steady-state evaporation coating system and method for a high-melting-point material in a fusion device. The system comprises a laser, a laser incidence window system, a telescopic crucible system and a gas component monitoring system. Laser beams generated by the laser are irradiated to the surface of the high-melting-point material in a crucible through the laser incidence window system, and steady-state evaporation of the high-melting-point material is achieved by adjusting the power density of laser spots. The system is matched with plasma auxiliary vapor deposition in the fusion device, so that a uniform film is formed on the surface of the first wall of the fusion device. The laser incidence window system monitors the air pressure in a vacuum chamber between two vacuum observation windows, so that the vacuum leakage of the fusion device caused by the damage of the laser beams to the vacuum observation windows can be avoided; and the gas component monitoring system monitors the content of the marking material below the high-melting-point material entering the plasma, so that an operator is reminded to replace the high-melting-point material in time, and the damage of laser to the crucible is effectively avoided.

Description

technical field [0001] The invention relates to the steady-state evaporation of high-melting-point materials inside a fusion reactor vacuum chamber, and is suitable for coating the first wall of a fusion device. Background technique [0002] In the physical experiments of nuclear fusion devices, the high-temperature plasma interacts with the wall, causing the cavity wall to release various impurities into the plasma, resulting in a huge loss of plasma energy. Therefore, effective suppression of impurities in the cavity is one of the major problems that must be solved to achieve controlled thermonuclear fusion. Excessive hydrogen recirculation levels can easily lead to uncontrollable plasma density, which can easily exceed the Greenwald density limit and eventually lead to plasma rupture. In the H-mode plasma discharge, the recirculation will affect the boundary transport barrier, which will affect the H-mode discharge, so the recirculation control of hydrogen and its isotop...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/32C23C14/54
CPCC23C14/32C23C14/544C23C14/548Y02E30/10
Inventor 汤中亮胡建生左桂忠彭兰兰黄明张德皓
Owner HEFEI INSTITUTES OF PHYSICAL SCIENCE - CHINESE ACAD OF SCI
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