Efficient silicon heterojunction solar cell and preparation method thereof
A technology for solar cells and silicon heterojunctions, which is applied in the field of solar cells and can solve the problems of reducing the open circuit voltage and affecting the quality of the intrinsic layer of amorphous silicon.
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0043] combine figure 1 , a high-efficiency silicon heterojunction solar cell of the present embodiment comprises an N-type crystalline silicon wafer 1, and the front side of the N-type crystalline silicon wafer 1 is sequentially provided with thin layers of SiO 2 Layer 301, hydrogenated amorphous silicon oxycarbide film layer 302, C-doped SiO 2 Layer 303, amorphous silicon doped N-type layer, TCO conductive layer 7 and electrode 9; the back of the N-type crystalline silicon wafer 1 is sequentially provided with a thin layer of SiO 2 Layer 201, hydrogenated amorphous silicon oxycarbide film layer 202, C-doped SiO 2 layer 203 , amorphous silicon doped P-type layer, TCO conductive layer 6 and electrode 8 . in,
[0044] The high-quality thin-layer SiO 2 The layer has a thickness of 1 nm and passivates the surface of the silicon substrate.
[0045] The thickness of the hydrogenated amorphous silicon oxycarbide thin film layer is 2nm. In the present embodiment, the hydrogenate...
Embodiment 2
[0052] A high-efficiency silicon heterojunction solar cell in this embodiment is basically the same as in Embodiment 1, except that the high-quality thin-layer SiO 2 The thickness of the layer is 3 nm. The thickness of the hydrogenated amorphous silicon oxycarbide film layer is 10nm, the non-stoichiometric ratio x of the hydrogenated amorphous silicon oxycarbide film is 0.95, the non-stoichiometric ratio y is 0.05, and the band gap is 1.7eV. The C-doped SiO 2 The thickness of the layer is 5 nm. The thickness of the amorphous silicon-doped P-type layer is 30nm, the thickness of the amorphous silicon-doped N-type layer is 30nm; the thickness of the TCO conductive layer is 110nm.
Embodiment 3
[0054] combine figure 1 , a high-efficiency silicon heterojunction solar cell of the present embodiment comprises an N-type crystalline silicon wafer 1, and the front side of the N-type crystalline silicon wafer 1 is sequentially provided with thin layers of SiO 2 Layer 301, hydrogenated amorphous silicon oxycarbide film layer 302, C-doped SiO 2 Layer 303, amorphous silicon doped N-type layer, TCO conductive layer 7 and electrode 9; the back of the N-type crystalline silicon wafer 1 is sequentially provided with a thin layer of SiO 2 Layer 201, hydrogenated amorphous silicon oxycarbide film layer 202, C-doped SiO 2 layer 203 , amorphous silicon doped P-type layer, TCO conductive layer 6 and electrode 8 . in,
[0055] The high-quality thin-layer SiO 2 The layer has a thickness of 2 nm and passivates the surface of the silicon substrate.
[0056] The thickness of the hydrogenated amorphous silicon oxycarbide film layer is 5nm, the non-stoichiometric ratio x of the hydrogena...
PUM
Property | Measurement | Unit |
---|---|---|
Thickness | aaaaa | aaaaa |
Thickness | aaaaa | aaaaa |
Bandgap width | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com