Schottky diode based on silicon carbide planar MOS structure
A technology of Schottky diode and MOS structure, which is applied in semiconductor devices, electrical components, circuits, etc., can solve serious and leakage current problems, achieve the effect of reducing gate-to-channel ratio, reducing switching loss, and improving electrical performance
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[0015] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.
[0016] Such as figure 1 As shown: in order to effectively reduce the switching loss of the semiconductor device and increase its switching speed, the switch of the Schottky diode controlled by the MOS gate channel can also be realized, thereby improving the electrical performance of the Schottky diode. In the embodiment of the present invention, On the cross-section of the Schottky diode, it includes a semiconductor substrate 1 and a P-type well region 2 dispo...
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