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Polarity surface distinguishing method for aluminum nitride single crystal polished wafer (0001) surface

A technology of aluminum nitride and polishing sheet, applied in chemical method analysis, chemical instrument and method, crystal growth and other directions, to achieve the effect of high efficiency, small damage and remarkable effect.

Active Publication Date: 2021-06-18
CHINA ELECTRONICS TECH GRP NO 46 RES INST
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In the current research, there is no method that only uses solution to etch and distinguishes the polar surface of AlN wafer (0001) by naked eyes. Therefore, a method that is simple, time-saving, less dangerous and less damaging to the polished surface of the wafer is urgently needed , differentiate the polarity of the AlN polished sheet (0001), and determine the Al surface and the N surface

Method used

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  • Polarity surface distinguishing method for aluminum nitride single crystal polished wafer (0001) surface
  • Polarity surface distinguishing method for aluminum nitride single crystal polished wafer (0001) surface

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0014] Example 1, a method for distinguishing polar planes on the (0001) plane of an aluminum nitride single crystal polished wafer, the specific steps are as follows:

[0015] 1). Preparation of corrosion solution

[0016] Add 100ml of deionized water to a 200ml beaker, and then add 5ml of ethylamine and 15ml of 6508 isopropanolamide in turn, and stir it with a glass rod to mix quickly and evenly.

[0017] 2). Heating of corrosive liquid

[0018] Place the beaker containing the corrosive solution on the heating platform, adjust the temperature of the heating platform to 60°C, and measure the temperature with a temperature gun.

[0019] 3). Corrosion of polishing sheet

[0020] After the temperature of the etching solution rises to 60°C, use plastic tweezers to hold the (0001) surface aluminum nitride single crystal polishing wafer to be distinguished and place it in the etching solution to ensure that the front and back sides of the wafer are fully in contact with the etchi...

Embodiment 2

[0023] Example 2, a method for distinguishing polar planes on the (0001) plane of an aluminum nitride single crystal polished wafer, the specific steps are as follows:

[0024] 1). Preparation of corrosion solution

[0025] Add 100ml of deionized water to a 200ml beaker, and then add 10ml of ethylamine and 30ml of 6508 isopropanolamide in turn, and stir it with a glass rod to mix quickly and evenly.

[0026] 2). Heating of corrosive liquid

[0027] Place the beaker containing the corrosive solution on the heating platform, adjust the temperature of the heating platform to 70°C, and measure the temperature with a temperature gun.

[0028] 3). Corrosion of polishing sheet

[0029] After the temperature of the etching solution rises to 70°C, use plastic tweezers to hold the (0001) surface aluminum nitride single crystal polished wafer to be distinguished and place it in the etching solution to ensure that the front and back sides of the wafer are in full contact with the etchin...

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Abstract

The invention relates to a polar surface distinguishing method for an aluminum nitride single crystal polished wafer (0001) surface, which comprises the following steps of: adding 5-10 parts of ethylamine and 15-30 parts of 6508 isopropanolamide into 100 parts of deionized water, and uniformly mixing the solution; placing a beaker containing the mixed solution on a heating table and heating the beaker to 60-70 DEG C, then placing a (0001)-face aluminum nitride double-face polished wafer with the cleaned surface into the beaker by clamping the wafer with plastic tweezers, wherein the two polished faces of the wafer are kept to make full contact with the mixed solution, and performing standing treatment for 5-10 min and taking out the aluminum nitride polished wafer; and washing the wafer with deionized water, and observing the front and back surfaces of the wafer, the smooth surface being the Al surface, and the rough surface being the N surface. The method has the beneficial effects that chemical reagent corrosion is adopted, the polar surfaces are distinguished according to different changes of the Al surface and the N surface under the action of the reagent, so that the method is excellent.

Description

technical field [0001] The invention relates to a method for distinguishing polar planes of aluminum nitride single crystal polished (0001) planes, which belongs to the analysis field of semiconductor materials. Background technique [0002] Aluminum nitride (AlN) single crystal has a large band gap, high breakdown field strength, high thermal conductivity, good thermal stability, and is completely transparent in the DUV band of visible light. It has broad applications in the fields of microelectronics and optoelectronics. Application prospect. AlGaN / GaN high-mobility transistor (HEMT) materials and devices exhibit excellent performance in high-frequency applications, especially for next-generation microwave power devices. [0003] The aluminum nitride single crystal ingot grown along the [0001] direction needs to go through directional cutting, grinding, polishing and other processing processes to obtain a single crystal polished sheet with a flattened surface (0001) surfa...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N31/00C30B33/10
CPCG01N31/00C30B33/10Y02P70/50
Inventor 徐世海张丽赖占平陈红娟李晖高飞边子夫李宝珠
Owner CHINA ELECTRONICS TECH GRP NO 46 RES INST
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