CrMoN/MoS2 wide-temperature-range lubricating wear-resistant composite film and preparation method thereof
A composite film, wide temperature range technology, applied in the field of CrMoN/MoS2 wide temperature range lubricating and wear-resistant composite film and its preparation field, to achieve the effect of improving high temperature resistance and wear resistance, and improving bonding force
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[0030] CrMoN / MoS proposed by the present invention 2 The preparation method of the wide temperature range lubricating and wear-resistant composite film comprises the following steps:
[0031] S1, target and sample cleaning
[0032] Clean the target and base material, dry them and put them into the vacuum chamber, the target includes Cr target, Mo target and MoS 2 target;
[0033] Preferably, clean the target and substrate materials with deionized water, anhydrous acetone and absolute alcohol, the substrates are nickel-based metals, Cr targets, Mo targets and MoS 2 The target purity is 99.9%.
[0034] S2, preparation of the transition layer
[0035] The air pressure of the vacuum chamber is pumped to 2×10 -3 At Pa, high-purity Ar gas (purity 99.999%) was introduced, and the substrate was plasma-cleaned with a high bias voltage of -500V for 15 minutes to remove impurities on the sample surface and activate the substrate surface, then turn on the Cr target power supply, and sp...
Embodiment 1
[0042] S1, target and sample cleaning
[0043] Clean the target and substrate materials with deionized water, anhydrous acetone and absolute alcohol, and send the target and substrate materials into the vacuum chamber after drying; Cr target, Mo target and MoS 2 The target purity is 99.9%;.
[0044] S2, preparation of the transition layer
[0045] The air pressure of the vacuum chamber is pumped to 2×10 -3 At Pa, high-purity Ar gas (purity 99.999%) is introduced. The substrate was plasma-cleaned for 15 min with a high bias voltage of -500V to remove impurities on the sample surface and activate the substrate surface. Then turn on the Cr target power supply, and sputter the transition layer Cr on the surface of the cleaned substrate to form a Cr phase transition layer to improve the film adhesion;
[0046] S3, preparation of surface layer
[0047] Open Cr target, Mo target and MoS 2 For the power supply of the target, use the magnetron sputtering deposition method to sput...
Embodiment 2
[0056] The implementation steps are the same as in Example 1, and the deposition parameters and film material composition are shown in Table 2-1 and Table 2-2 respectively.
[0057] Table 2-1 Magnetron sputtering deposition process parameters
[0058]
[0059] CrMoN / MoS 2 The composition of the deposited materials involved in the composite film is shown in Table 2-2
[0060] Table 2-2 Material composition of each layer of film in Example 2
[0061]
[0062] The performance detection of the film obtained in embodiment 2: the surface hardness of the film is 13.2GPa, the bonding strength is 31.6N, and the friction coefficient in the wide temperature range (RT-700° C.) is 0.54~0.18 (ball-on-disk contact, dual ball material Al 2 o 3 , rotation radius 5mm, speed 0.15m / s, load 10N), wear rate 1.2×10 -6 ~7.9×10 -6 mm 3 N -1 m -1 .
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Abstract
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