Method for reducing resistance of silicon-based bipolar plate, silicon-based bipolar plate and fuel cell
A bipolar plate, silicon-based technology, applied in the direction of fuel cells, circuits, electrical components, etc., can solve the problems of high process difficulty, problems, corrosion durability of cooling channels, etc., to achieve reduced bulk resistance, excellent durability, and reduced contact The effect of resistance
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Embodiment 1
[0047] Example 1: The technical solution of the first embodiment is the same as the above implementation, and the difference is that please see figure 1 The silicon-based bipolar plate 10 shown, including a stacked contactless cathode plate 11 and anode plate 12, each other in both the cathode plate 11 and the anode plate 12 each integrally into a doped diffusion layer 13a, 13b, by doping diffusion Layers 13a, 13b are directly stacked in stacked composite electrical contact; where, please refer to Figure 5 As shown, the preparation process of the silicon-based bipolar plate 10 in this embodiment includes the following operation steps:
[0048] S10) ', selecting an N-type doped monocrystalline silicon sheet having two resistance of 2.5mΩ * cm on the surface, respectively, as a silicon-based cathode plate 11 and a silicon-based anode plate 12, and a silicon-based cathode plate 11, respectively. The two sides are provided with an oxidizing agent flow path 11a and a cooling flow path ...
Embodiment 2
[0055] Example 2: The technical solution of the present embodiment is in Example 1, the difference is that figure 1 As shown in the present embodiment, two N-type doped monitocarbon wafers provided with a dioflow in the surface are selected as the silicon-based cathode plate 11 and the silicon-based anode plate 12; detected, the low resistance bipolar The contact resistance value between the silicon-based cathode plate 11 and the silicon base plate 12 in the plate 10 is 4.1mΩ * cm. 2 .
Embodiment 3
[0056] Example 3: The technical solution of this Example 3 is in Example 1, and the difference is that please see figure 2 The silicon-based bipolar plate 20 shown, includes a stacked silicon-based cathode plate 21 and a silicon-based anode plate 22, a doped diffusion layer 23a in a double-sided surface of the silicon-based cathode plate 21; detected, resulting The contact resistance value between the silica cathode plate 21 and the silicon-based anode plate 22 in the resistor bipolar plate 20 is 10.71mΩ * cm 2 .
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Abstract
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