A kind of inverse opal photonic crystal reusable thin film material and preparation method thereof

An inverse opal and photonic crystal technology, applied in the field of inverse opal photonic crystal reusable film materials and its preparation, can solve the problems of pattern burrs and low resolution of information display, etc., and achieve good use stability and excellent self-support The effect of performance and flexibility

Active Publication Date: 2022-07-26
QINGDAO UNIV OF SCI & TECH
View PDF6 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Due to the limitations of the traditional stimulus response mechanism, only the intermittent regulation of the color of the inkless printing material can be realized, without intermediate colors; and due to the uncontrollable diffusion or conduction of the stimulus source, the pattern has burrs and edges, which leads to the resolution of information display. low

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A kind of inverse opal photonic crystal reusable thin film material and preparation method thereof
  • A kind of inverse opal photonic crystal reusable thin film material and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0052] A method for preparing an inverse opal photonic crystal reusable thin film material, the specific steps are as follows:

[0053] (1) Preparation of an opal photonic crystal template array:

[0054] Monodisperse silica nanospheres with a diameter of 200 nm were selected to prepare opal-type photonic crystal arrays; the monodisperse silica microspheres were assembled into three-dimensional ordered photonic crystal arrays by dipping and pulling self-assembly method; The monodispersed silica nano-microspheres are silica / ethanol dispersion liquid, and the mass fraction is 8%;

[0055] (2) Preparation of polymer inverse opal film:

[0056] The selected flexible polymer material is: polyvinylidene fluoride / N,N-dimethylformamide dispersion, the mass fraction is 8wt%;

[0057] The above-mentioned polyvinylidene fluoride / N,N-di-methylformamide dispersion liquid is uniformly infiltrated into the silicon dioxide photonic crystal array obtained in step (1), and the hydrofluoric ac...

Embodiment 2

[0066] A method for preparing an inverse opal photonic crystal reusable thin film material, the specific steps are as follows:

[0067] (1) Preparation of an opal photonic crystal template array:

[0068] The monodispersed cadmium sulfide nanospheres with a diameter of 250 nm are selected to prepare opal photonic crystal arrays; the monodispersed cadmium sulfide microspheres are assembled into a three-dimensional ordered photonic crystal array by a vertical deposition self-assembly method; The dispersed cadmium sulfide nano-microspheres are cadmium sulfide / anhydrous ethanol dispersion liquid, the mass fraction is 10%;

[0069] (2) Preparation of polymer inverse opal film:

[0070] The flexible polymer material is: polyethersulfone / N,N-dimethylacetamide dispersion, the mass fraction is 10wt%;

[0071] The above-mentioned polyethersulfone / N,N-dimethylacetamide dispersion liquid is uniformly infiltrated into the cadmium sulfide photonic crystal array obtained in step (1), and t...

Embodiment 3

[0079] A method for preparing an inverse opal photonic crystal reusable thin film material, the specific steps are as follows:

[0080] (1) Preparation of an opal photonic crystal template array:

[0081] Monodisperse zinc sulfide nanospheres with a diameter of 220 nm were selected to prepare opal photonic crystal arrays; the monodisperse zinc sulfide microspheres were assembled into three-dimensional ordered photonic crystal arrays by spin coating self-assembly method;

[0082] The monodispersed zinc sulfide nano-microspheres are zinc sulfide / absolute ethanol dispersion, and the mass fraction is 12%;

[0083] (2) Preparation of polymer inverse opal film:

[0084] The selected flexible polymer material is: polymethyl methacrylate / tetrahydrofuran dispersion, the mass fraction is 6wt%;

[0085] The above-mentioned polymethyl methacrylate / tetrahydrofuran dispersion is uniformly infiltrated into the zinc sulfide photonic crystal array obtained in step (3), and the opal template ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
particle diameteraaaaaaaaaa
diameteraaaaaaaaaa
Login to view more

Abstract

The invention belongs to the field of new materials, and specifically provides an inverse opal type photonic crystal reusable thin film material and a preparation method thereof. The precursor liquid is prepared as the base material and has excellent self-supporting properties; at the same time, based on the controllable deposition and analysis of metal ions, its refractive index is linearly adjusted to achieve precise control of the color of photonic crystal paper, enabling full-color printing and fast erasing of information. In addition, it has good cycle stability.

Description

technical field [0001] The invention belongs to the field of new materials, and specifically provides an inverse opal type photonic crystal reusable thin film material and a preparation method thereof. Background technique [0002] Resource and environmental issues are the bottlenecks for high-quality social development at present and even in the future. As one of the pillar industries of the national economy, pulping and papermaking is also facing a bottleneck problem: a serious shortage of fiber resources, especially in recent years, my country has restricted the import of solid waste (waste paper), and the shortage of fiber resources is even more serious. In addition, the production process of ink, ink, pigment and toner will consume a lot of energy and organic solvents, and will release irritating VOCs and fine particle toner during the printing process, which will bring huge damage to the environment and human health. In order to alleviate the above problems, developin...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Patents(China)
IPC IPC(8): C08J5/18C08J9/26C08J9/40C08L27/16C08L81/06C08L33/12
CPCC08J5/18C08J9/26C08J9/405C08J2327/16C08J2381/06C08J2333/12C08J2201/044C08J2479/04
Inventor 孟尧肖彬郝旸宋晓明陈夫山
Owner QINGDAO UNIV OF SCI & TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap