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Method for preparing inorganic transparent super-hydrophobic film by PECVD (plasma enhanced chemical vapor deposition) technology

A super-hydrophobic, thin-film technology, applied in the fields of super-hydrophobic material technology and environmental science, can solve the problems of poor film adhesion and low light transmittance, etc.

Active Publication Date: 2021-09-10
CHINA THREE GORGES UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Regardless of using fluorosilane or organosiloxane as a low surface modifier, the superhydrophobic films prepared by the above organic material synthesis methods all have the disadvantages of poor film adhesion and low light transmittance.

Method used

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  • Method for preparing inorganic transparent super-hydrophobic film by PECVD (plasma enhanced chemical vapor deposition) technology
  • Method for preparing inorganic transparent super-hydrophobic film by PECVD (plasma enhanced chemical vapor deposition) technology
  • Method for preparing inorganic transparent super-hydrophobic film by PECVD (plasma enhanced chemical vapor deposition) technology

Examples

Experimental program
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Effect test

Embodiment 1

[0028] An inorganic transparent super-hydrophobic film prepared based on PECVD technology and a preparation method thereof, the method comprising the following steps:

[0029] (1) Cleaning the glass substrate by common methods in this field;

[0030] (2) Fix a mask plate with a certain mesh on the surface of the cleaned glass substrate, the mesh number of the mask plate is: 50 mesh;

[0031](3) Put the glass substrate in step (2) into the PECVD deposition chamber, use methane and silane as the working gas, set the PECVD deposition parameters, and perform the first deposition on the glass substrate. The PECVD deposition parameters are: RF power 250W, RF frequency 13.56MHz, substrate temperature 200°C, cavity pressure 60Pa, flow rate of methane gas with a purity of 99.999% 40 sccm, flow rate of silane gas with a purity of 99.999% 20 sccm, deposition Time 20 minutes;

[0032] (4) After the first deposition, the glass substrate in step (3) is taken out and the mask plate deposit...

Embodiment 1-1

[0039] The operation steps are the same as in Example 1, and only one deposition is performed, that is, steps (1), (2), and (3) are performed to obtain a glass substrate deposited with a silicon carbide film, and the incident light transmittance in the 300-900 nm band is 95%. , The hydrophobic angle is 53.5 degrees.

Embodiment 1-2

[0041] The operation steps are the same as in Example 1, and only two depositions are carried out, that is, steps (1) (2), (3), (4), and (5) are carried out to obtain a glass substrate with a silicon carbide thin film, then at 300-900 The transmittance of incident light in the nm band is 93%, and the hydrophobic angle is 75.5 degrees.

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Abstract

The invention discloses a method for preparing an inorganic transparent super-hydrophobic silicon carbide film based on a PECVD (Plasma Enhanced Chemical Vapor Deposition) technology. Aiming at the fact that a super-hydrophobic film needs to have a surface multi-stage rough structure and the characteristic of low surface energy, methane and silane are used as working gases, and a plasma enhanced chemical vapor deposition technology is adopted to construct a silicon carbide film with a multi-stage micro-nano rough structure on the surface of a glass plate in a mask plate multi-time cross deposition mode. Based on the rough structure, PECVD (Plasma Enhanced Chemical Vapor Deposition) process parameters are optimized, so that the prepared silicon carbide film contains a large number of low-surface-energy -CHn groups, a low-surface-energy modification process on a material by common organosiloxane and toxic fluoride is avoided, and the silicon carbide film with transparency and super-hydrophobic property can be obtained under the condition of without adopting any organic surface modifier. The prepared silicon carbide transparent super-hydrophobic film is low in cost and has wide application prospects in the aspects of self-cleaning, antifouling and the like of photovoltaic glass plates, display screens, windshields and building curtain wall glass.

Description

technical field [0001] The invention belongs to the fields of superhydrophobic material technology and environmental science, and specifically relates to an inorganic transparent superhydrophobic film prepared based on PECVD technology and a preparation method thereof. Background technique [0002] Transparent superhydrophobic films have good application value in self-cleaning fields such as solar photovoltaic power generation, solar thermal utilization, glass curtain walls and automobile windshields. At present, transparent superhydrophobic films are mainly prepared by organic material synthesis techniques. Although these techniques can realize the superhydrophobic properties of films, the films cannot have the characteristics of strong adhesion, good mechanical properties, high light transmittance, and environmentally friendly synthesis methods. The rough surface structure and low surface energy of materials are the two core factors to achieve superhydrophobic self-cleanin...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/32C23C16/505C23C16/04
CPCC23C16/325C23C16/505C23C16/042Y02B10/10
Inventor 姜礼华侯萍萍韩梦梦何思妙向鹏肖婷杨雄波谭新玉
Owner CHINA THREE GORGES UNIV